SCHEMBL2387565

SCHEMBL2387565

O=S(=O)(OC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)F

nearest known ligand 0.41

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CA2 P00918 6/20 0.41
CA1 P00915 5/20 0.39
MMP1 P03956 2/20 0.39
MMP2 P08253 2/20 0.39
MMP9 P14780 2/20 0.39
MMP8 P22894 2/20 0.39
MMP13 P45452 2/20 0.39
F2 P00734 4/20 0.35
PRSS1 P07477 4/20 0.35
PRSS2 P07478 4/20 0.35
PRSS3 P35030 4/20 0.35
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL482177 1.00 CA2 (0.41) CA2CA1MMP1MMP2MMP9
Ammonia Solution, Strong SCHEMBL27813781 0.98 CA2 (0.40) CA2CA1MMP1MMP2MMP9
SCHEMBL9143150 0.88 CA2 (0.38) CA2CA1MMP1MMP2MMP9
SCHEMBL2959331 0.88 CA2 (0.38) CA2CA1MMP1MMP2MMP9
SCHEMBL9146488 0.88 CA2 (0.38) CA2CA1MMP1MMP2MMP9
SCHEMBL9141603 0.88 CA2 (0.38) CA2CA1MMP1MMP2MMP9
SCHEMBL7560689 0.88 CA2 (0.38) CA2CA1MMP1MMP2MMP9
SCHEMBL27096242 0.88 CA2 (0.43) CA2CA1MMP1MMP2MMP9
SCHEMBL777176 0.86 CA2 (0.34) CA2CA1MMP1MMP2MMP9
Tetrylammonium SCHEMBL27825036 0.86 CA2 (0.32) CA2CA1MMP1MMP2MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7084202-B2 Molecular complexes and release agents EASTMAN KODAK COMPANY (US) 2006-08-01 US claimed
US-8013023-B2 Charged emulsions for site-specific deposition of matter at micro and nano scale RAUSTECH PTY LTD (AU) 2011-09-06 US disclosed
US-20070213410-A1 Charged Emulsions For Site-Specific Deposition Of Matter At Micro And Nano Scale RAUSTECH PTY LTD. (AU) 2007-09-13 US disclosed
US-7084202-B2 Molecular complexes and release agents EASTMAN KODAK COMPANY (US) 2006-08-01 US disclosed
US-20040126718-A1 Modified antistatic compositions and thermally developable materials containing same SAKIZADEH KUMARS (US) 2004-07-01 US disclosed
US-6699648-B2 COMPRISING MODIFIED FLUOROCHEMICALS EASTMAN KODAK COMPANY 2004-03-02 US disclosed
US-20030232945-A1 Molecular complexes and release agents FAR EAST DEVELOPMENT LTD. 2003-12-18 US disclosed
US-20030198901-A1 Modified antistatic compositions and thermally developable materials containing same EASTMAN KODAK COMPANY 2003-10-23 US disclosed
EP-1348998-A1 Antistatic compositions and thermally developable photographic materials containing the same EASTMAN KODAK COMPANY (US) 2003-10-01 EP disclosed