SCHEMBL2389036

SCHEMBL2389036

CCCCCCCCCCCCCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.41

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
CES2 O00748 3/20 0.41
LPAR1 Q92633 1/20 0.41
LPAR3 Q9UBY5 1/20 0.41
TSHR P16473 1/20 0.36
THRB P10828 1/20 0.36
FAAH O00519 7/20 0.34
CES1 P23141 6/20 0.34
GGPS1 O95749 3/20 0.34
MEN1 O00255 1/20 0.34
CYP1A2 P05177 1/20 0.34
KMT2A Q03164 1/20 0.34
HSD17B10 Q99714 1/20 0.34
FDPS P14324 5/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15156214 1.00 CES2 (0.41) CES2LPAR1LPAR3TSHRTHRB
SCHEMBL8442314 1.00 CES2 (0.41) CES2LPAR1LPAR3TSHRTHRB
SCHEMBL1707472 1.00 CES2 (0.41) CES2LPAR1LPAR3TSHRTHRB
SCHEMBL15326061 1.00 CES2 (0.41) CES2LPAR1LPAR3TSHRTHRB
SCHEMBL10000307 1.00 CES2 (0.41) CES2LPAR1LPAR3TSHRTHRB
SCHEMBL23560381 1.00 CES2 (0.41) CES2LPAR1LPAR3TSHRTHRB
SCHEMBL2725276 1.00 CES2 (0.41) CES2LPAR1LPAR3TSHRTHRB
SCHEMBL6515101 1.00 CES2 (0.41) CES2LPAR1LPAR3TSHRTHRB
SCHEMBL22277214 1.00 CES2 (0.41) CES2LPAR1LPAR3TSHRTHRB
SCHEMBL19462783 1.00 CES2 (0.41) CES2LPAR1LPAR3TSHRTHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117897439-A Method for screening solvent for extraction of polyvinyl chloride, method for recovering waste material, and recovered polyvinyl chloride and composition 株式会社LG化学 2024-04-16 CN claimed
CN-117897440-A Method for screening solvent for extraction of polyvinyl chloride, method for recycling waste material, recycled polyvinyl chloride and composition 株式会社LG化学 2024-04-16 CN claimed
WO-2023033601-A1 METHOD FOR SCREENING SOLVENT FOR POLYVINYL CHLORIDE EXTRACTION, RECYCLING METHOD FOR WASTE MATERIAL, AND RECYCLED POLYVINYL CHLORIDE AND COMPOSITION 주식회사 엘지화학 2023-03-09 WO claimed
WO-2023033605-A1 METHOD FOR SCREENING SOLVENT FOR EXTRACTING POLYVINYL CHLORIDE, METHOD FOR RECYCLING WASTE, RECYCLED POLYVINYL CHLORIDE, AND COMPOSITION 주식회사 엘지화학 2023-03-09 WO claimed
WO-2017179990-A1 A SCENT RELEASING CORROSION OR CORROSIVE ENVIRONMENT INDICATING COATING SYSTEM, A METAL STRUCTURE WITH THE SYSTEM AND A METHOD FOR DETECTING CORROSION OCEANEERING ASSET INTEGRITY - LCI (NO) 2017-10-19 WO claimed
US-20240266608-A1 LITHIUM SECONDARY BATTERY TERAWATT TECHNOLOGY K.K. (JP) 2024-08-08 US disclosed
CN-117897439-A Method for screening solvent for extraction of polyvinyl chloride, method for recovering waste material, and recovered polyvinyl chloride and composition 株式会社LG化学 2024-04-16 CN disclosed
WO-2023042262-A1 LITHIUM SECONDARY BATTERY TeraWatt Technology株式会社 2023-03-23 WO disclosed
WO-2023033601-A1 METHOD FOR SCREENING SOLVENT FOR POLYVINYL CHLORIDE EXTRACTION, RECYCLING METHOD FOR WASTE MATERIAL, AND RECYCLED POLYVINYL CHLORIDE AND COMPOSITION 주식회사 엘지화학 2023-03-09 WO disclosed
WO-2023033605-A1 METHOD FOR SCREENING SOLVENT FOR EXTRACTING POLYVINYL CHLORIDE, METHOD FOR RECYCLING WASTE, RECYCLED POLYVINYL CHLORIDE, AND COMPOSITION 주식회사 엘지화학 2023-03-09 WO disclosed
WO-2017179990-A1 A SCENT RELEASING CORROSION OR CORROSIVE ENVIRONMENT INDICATING COATING SYSTEM, A METAL STRUCTURE WITH THE SYSTEM AND A METHOD FOR DETECTING CORROSION OCEANEERING ASSET INTEGRITY - LCI (NO) 2017-10-19 WO disclosed
US-8609178-B2 Substrates for spatially selective micron and nanometer scale deposition and combinatorial modification and fabrication RAUSTECH PTY LTD (AU) 2013-12-17 US disclosed
US-20070134930-A1 Micro and nano scale fabrication and manufacture by spatially selective deposition RAUSTECH PTY LTD (AU) 2007-06-14 US disclosed
US-20070065822-A1 Substrates for spatially selective micron and nanometer scale deposition and combinatorial modification and fabrication RAUSTECH PTY LTD (AU) 2007-03-22 US disclosed
EP-1648965-A1 CHARGED EMULSIONS FOR SITE-SPECIFIC DEPOSITION OF MATTER AT MICRO AND NANO SCALE Raustech Pty Ltd. (AU) 2006-04-26 EP disclosed
EP-1644517-A1 MICRO AND NANO SCALE FABRICATION AND MANUFACTURE BY SPATIALLY SELECTIVE DEPOSITION Raustech Pty Ltd. (AU) 2006-04-12 EP disclosed
EP-1644518-A1 SUBSTRATES FOR SPATIALLY SELECTIVE MICRON AND NANOMETER SCALE DEPOSITION AND COMBINATORIAL MODIFICATION AND FABRICATION Raustech Pty Ltd. (AU) 2006-04-12 EP disclosed
WO-2005000970-A1 CHARGED EMULSIONS FOR SITE-SPECIFIC DEPOSITION OF MATTER AT MICRO AND NANO SCALE RAUSTECH PTY LTD (AU) 2005-01-06 WO disclosed
WO-2005001121-A1 SUBSTRATES FOR SPATIALLY SELECTIVE MICRON AND NANOMETER SCALE DEPOSITION AND COMBINATORIAL MODIFICATION AND FABRICATION RAUSTECH PTY LTD (AU) 2005-01-06 WO disclosed
WO-2005001120-A1 MICRO AND NANO SCALE FABRICATION AND MANUFACTURE BY SPATIALLY SELECTIVE DEPOSITION RAUSTECH PTY LTD (AU) 2005-01-06 WO disclosed