SCHEMBL23907133

SCHEMBL23907133

CCOCOc1cc(C(F)(F)F)c(OCOCC)cc1C(F)(F)F

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR2A P28223 5/20 0.41
HTR2C P28335 1/20 0.39
RXRA P19793 1/20 0.37
RXRB P28702 1/20 0.37
RXRG P48443 1/20 0.37
L3MBTL1 Q9Y468 2/20 0.34
LMNA P02545 1/20 0.34
MAPT P10636 1/20 0.34
ATM Q13315 1/20 0.34
CTSS P25774 4/20 0.34
AR P10275 2/20 0.33
CTSK P43235 3/20 0.33
PDE3B Q13370 1/20 0.32
PDE3A Q14432 1/20 0.32
KCNK3 O14649 1/20 0.31
KCNK9 Q9NPC2 1/20 0.31
TRPA1 O75762 1/20 0.31
KDM4E B2RXH2 1/20 0.31
KMT2A Q03164 1/20 0.31
S1PR1 P21453 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23906767 0.90 HTR2A (0.36) HTR2AHTR2CRXRARXRBRXRG
SCHEMBL30006527 0.81 S1PR4 (0.46) RXRARXRBRXRGL3MBTL1LMNA
SCHEMBL31404978 0.80 HTR2A (0.30) HTR2A
SCHEMBL31405001 0.77 NOTUM (0.35) L3MBTL1LMNAMAPTATM
SCHEMBL22655148 0.76 MAPT (0.32) MAPT
SCHEMBL31404969 0.75
SCHEMBL12824875 0.74 MAPT (0.38) HTR2ARXRARXRBRXRGL3MBTL1
SCHEMBL23906793 0.73 PIM1 (0.39) L3MBTL1CTSSKCNK3KCNK9TRPA1
SCHEMBL23326294 0.73 HTR2A (0.46) HTR2AHTR2CRXRARXRBRXRG
SCHEMBL29775347 0.73 HTR2A (0.46) HTR2AHTR2CRXRARXRBRXRG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-20210311392-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-10-07 US disclosed