⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16848449 | 0.75 | — | — | |
| SCHEMBL31602189 | 0.73 | — | — | |
| SCHEMBL11179910 | 0.73 | — | — | |
| SCHEMBL11331451 | 0.71 | — | — | |
| SCHEMBL27974681 | 0.71 | — | — | |
| SCHEMBL23729542 | 0.71 | — | — | |
| SCHEMBL2845756 | 0.71 | — | — | |
| SCHEMBL3844653 | 0.69 | — | — | |
| Hydrochloric Acid SCHEMBL11149403 | 0.69 | — | — | |
| SCHEMBL22229858 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11623935-B2 | Raw material for forming thin film by atomic layer deposition method, method of producing thin film, and alkoxide compound | ADEKA CORPORATION (JP) | 2023-04-11 | — | — | US | disclosed |
| US-20220024953-A1 | RAW MATERIAL FOR FORMING THIN FILM BY ATOMIC LAYER DEPOSITION METHOD, METHOD OF PRODUCING THIN FILM, AND ALKOXIDE COMPOUND | ADEKA CORPORATION (JP) | 2022-01-27 | — | — | US | disclosed |
| EP-3901326-A1 | RAW MATERIAL FOR FORMING THIN FILM FOR ATOMIC LAYER DEPOSITION, PRODUCTION METHOD OF THIN FILM, AND ALKOXIDE COMPOUND | ADEKA CORPORATION (JP) | 2021-10-27 | — | — | EP | disclosed |