SCHEMBL23928250

SCHEMBL23928250

C=Cc1cc(O)c2ncccc2c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 15/20 0.53
L3MBTL1 Q9Y468 10/20 0.53
NPC1 O15118 7/20 0.53
RAB9A P51151 7/20 0.53
COMT P21964 2/20 0.52
MMP2 P08253 1/20 0.52
CHRM1 P11229 1/20 0.52
TSHR P16473 1/20 0.52
ADRA1A P35348 1/20 0.52
METAP2 P50579 1/20 0.52
METAP1 P53582 1/20 0.52
HDAC8 Q9BY41 1/20 0.52
MAPT P10636 1/20 0.50
PKM P14618 1/20 0.50
NFKB1 P19838 1/20 0.50
HTT P42858 1/20 0.50
CASP6 P55212 1/20 0.50
NFKB2 Q00653 1/20 0.50
RELA Q04206 1/20 0.50
SMN1; SMN2 Q16637 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29953052 0.83 ERN1 (0.54) KDM4EL3MBTL1NPC1RAB9ACOMT
SCHEMBL28592203 0.83 ERN1 (0.54) KDM4EL3MBTL1NPC1RAB9ACOMT
SCHEMBL4042060 0.79 CCR1 (0.41) KDM4EL3MBTL1NPC1RAB9ACOMT
SCHEMBL13849038 0.79 CCR1 (0.50) KDM4EL3MBTL1NPC1RAB9AMMP2
SCHEMBL23196116 0.79 CCR1 (0.50) KDM4EL3MBTL1MMP2TSHRMAPT
SCHEMBL20176001 0.76 COMT (0.59) KDM4EL3MBTL1NPC1RAB9ACOMT
SCHEMBL11808148 0.76 COMT (0.61) KDM4EL3MBTL1NPC1RAB9ACOMT
SCHEMBL6897816 0.76 KDM4E (0.49) KDM4EL3MBTL1NPC1RAB9ACOMT
SCHEMBL20176005 0.74 KDM4E (0.59) KDM4EL3MBTL1NPC1RAB9ACOMT
SCHEMBL3711196 0.74 KDM4E (0.59) KDM4EL3MBTL1NPC1RAB9ACOMT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11592742-B2 Photoresist composition, its manufacturing method, and manufacturing methods of metal pattern and array substrate HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD. (CN) 2023-02-28 US claimed
US-20210333710-A1 Photoresist Composition, its Manufacturing Method, and Manufacturing Methods of Metal Pattern and Array Substrate HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD. (CN) 2021-10-28 US claimed
US-11592742-B2 Photoresist composition, its manufacturing method, and manufacturing methods of metal pattern and array substrate HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD. (CN) 2023-02-28 US disclosed
US-20210333710-A1 Photoresist Composition, its Manufacturing Method, and Manufacturing Methods of Metal Pattern and Array Substrate HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD. (CN) 2021-10-28 US disclosed
CN-109426070-A The preparation method of photoetching compositions, metal pattern and array substrate 京东方科技集团股份有限公司 2019-03-05 CN disclosed