Alcohol

Alcohol

SCHEMBL23929050

CCO.Sc1cccc2cc3ccccc3cc12

nearest known ligand 0.42

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

MMP1MMP13MMP7MMP8polrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Alcohol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.42
KDM4E B2RXH2 4/20 0.42
GAA P10253 2/20 0.42
MEN1 O00255 3/20 0.39
KMT2A Q03164 3/20 0.39
MAPT P10636 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
HSD17B10 Q99714 3/20 0.35
HIF1A Q16665 1/20 0.35
CYP1B1 Q16678 1/20 0.35
CYP1A2 P05177 6/20 0.35
CYP2A6 P11509 2/20 0.35
HTR2A P28223 2/20 0.35
NQO1 P15559 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
HPGD P15428 2/20 0.35
CYP2C19 P33261 2/20 0.34
GLA P06280 1/20 0.34
HTR2C P28335 1/20 0.34
HTR2B P41595 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Propanol SCHEMBL28407382 0.93 ALDH1A1 (0.40) ALDH1A1KDM4EGAAMEN1KMT2A
SCHEMBL513014 0.88 ALDH1A1 (0.45) ALDH1A1KDM4EGAAMEN1KMT2A
SCHEMBL28476808 0.86 ALDH1A1 (0.44) ALDH1A1KDM4EGAAMEN1KMT2A
SCHEMBL28471051 0.86 ALDH1A1 (0.44) ALDH1A1KDM4EGAAMEN1KMT2A
SCHEMBL14354302 0.86 ALDH1A1 (0.44) ALDH1A1KDM4EGAAMEN1KMT2A
SCHEMBL29390672 0.86 ALDH1A1 (0.44) ALDH1A1KDM4EGAAMEN1KMT2A
SCHEMBL29226502 0.80 ALDH1A1 (0.48) ALDH1A1KDM4EGAAMEN1KMT2A
Hydrogen Sulfide SCHEMBL28520895 0.78 ALDH1A1 (0.46) ALDH1A1KDM4EGAAMEN1KMT2A
Anthracene SCHEMBL1456301 0.78 CYP2A6 (0.50) ALDH1A1KDM4EGAAMEN1KMT2A
Alcohol SCHEMBL14841565 0.76 CYP2A6 (0.48) ALDH1A1KDM4EGAAMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111752098-A Self-luminous photosensitive resin composition, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 CN claimed
CN-111752100-A Photosensitive resin composition containing bisimidazole photoinitiator, application thereof, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 CN claimed
CN-111752097-A Self-luminous photosensitive resin composition, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 CN claimed
CN-115128899-A Photosensitive resin composition with improved system hue stability 常州正洁智造科技有限公司 2022-09-30 CN disclosed
CN-111752091-B Application of HABI mixed photoinitiator in UVLED photocuring 常州正洁智造科技有限公司 2022-09-06 CN disclosed
CN-112835261-B EO/PO modified 9-phenylacridine photosensitizer and application thereof 常州强力电子新材料股份有限公司 2022-06-07 CN disclosed
CN-114442425-A Curable resin composition, solder resist film formed from the same, interlayer insulating material, and printed wiring board 常州正洁智造科技有限公司 2022-05-06 CN disclosed
CN-114326309-A Photosensitive resin composition and application thereof 常州正洁智造科技有限公司 2022-04-12 CN disclosed
CN-113929624-A Pyrazoline compound, photosensitive resin composition and patterning method 常州强力电子新材料股份有限公司 2022-01-14 CN disclosed
WO-2021213087-A1 ETHOXY/PROPOXY MODIFIED PYRAZOLINE ORGANIC MATTER, APPLICATION THEREOF, PHOTOCURABLE COMPOSITION, AND PHOTORESIST 常州强力电子新材料股份有限公司 (CN) 2021-10-28 WO disclosed
CN-113527207-A Ethoxy/propoxy modified pyrazoline organic matter, application thereof, photocuring composition and photoresist 常州强力电子新材料股份有限公司 2021-10-22 CN disclosed
CN-112062721-A HABI photoinitiator capable of improving system stability and application thereof 常州正洁智造科技有限公司 2020-12-11 CN disclosed
CN-111752091-A Application of HABI mixed photoinitiator in UVLED photocuring 常州格林感光新材料有限公司 2020-10-09 CN disclosed
CN-111747897-A Hexaarylbisimidazole photoinitiator and application thereof 常州格林感光新材料有限公司 2020-10-09 CN disclosed
CN-111752100-A Photosensitive resin composition containing bisimidazole photoinitiator, application thereof, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 CN disclosed
CN-111752097-A Self-luminous photosensitive resin composition, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 CN disclosed
CN-111752098-A Self-luminous photosensitive resin composition, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 CN disclosed
CN-111752096-A Photosensitive resin composition for color filter and color filter 常州格林感光新材料有限公司 2020-10-09 CN disclosed
CN-111258180-A Hexaarylbisimidazole mixed photoinitiator and application thereof 常州格林感光新材料有限公司 2020-06-09 CN disclosed
CN-111258181-A Hexaarylbisimidazole mixed photoinitiator 常州格林感光新材料有限公司 2020-06-09 CN disclosed