⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL27628561 | 1.00 | — | — | |
| Fluoride SCHEMBL7632863 | 0.82 | — | — | |
| Fluoride SCHEMBL8166062 | 0.82 | — | — | |
| Fluoride SCHEMBL9247546 | 0.82 | — | — | |
| Fluoride SCHEMBL8778147 | 0.82 | — | — | |
| Fluoride SCHEMBL23065011 | 0.82 | — | — | |
| Fluoride SCHEMBL4126350 | 0.82 | — | — | |
| Fluoride SCHEMBL11744617 | 0.82 | — | — | |
| Fluoride SCHEMBL22158006 | 0.82 | — | — | |
| Fluoride SCHEMBL7637704 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110229399-A1 | Method for the production of polycrystalline silicon | SUNLIT S.R.L. | 2011-09-22 | — | — | US | claimed |
| EP-2362852-A2 | METHOD FOR THE PRODUCTION OF POLYCRYSTALLINE SILICON | Sunlit S.R.L. (IT) | 2011-09-07 | — | — | EP | claimed |
| WO-2010046751-A2 | METHOD FOR THE PRODUCTION OF POLYCRYSTALLINE SILICON | SUNLIT S.R.L. (IT) | 2010-04-29 | — | — | WO | claimed |
| US-6743728-B2 | Method for forming shallow trench isolation | NANYA TECHNOLOGY CORPORATION (TW) | 2004-06-01 | — | — | US | claimed |
| US-20040058549-A1 | Method for forming shallow trench isolation | NANYA TECHNOLOGY CORPORATION (TW) | 2004-03-25 | — | — | US | claimed |
| JP-1214871-A | — | — | None | — | — | JP | disclosed |
| WO-2023226052-A1 | COATING SLURRY, SEPARATOR, SEPARATOR PREPARATION METHOD, AND BATTERY | 深圳市星源材质科技股份有限公司 | 2023-11-30 | — | — | WO | disclosed |
| CN-109694074-A | A kind of method that electrochemical process prepares MXenes and its derivates nanometer piece | 青岛大学 | 2019-04-30 | — | — | CN | disclosed |
| CN-107004912-A | Electrolyte and metal hydride battery | 巴斯夫公司 | 2017-08-01 | — | — | CN | disclosed |
| CN-106010826-A | Selectively Removing Titanium Nitride Hard Mask and Etch Residue Removal | 气体产品与化学公司 | 2016-10-12 | — | — | CN | disclosed |
| US-20100221171-A1 | METHOD FOR PRODUCING POLYCRYSTALLINE SILICON | OBSCHESTVO S OGRANICHENNOY OTVETSTVENNOSTYU "SOLAR SI\ (RU) | 2010-09-02 | — | — | US | disclosed |
| EP-2172423-A2 | METHOD FOR PRODUCING POLYCRYSTALLINE SILICON FROM A HYDROSILICOFLUORIC ACID SOLUTION AND A PLANT FOR PRODUCING SILICON TETRAFLUORIDE AND POLYCRYSTALLINE SILICON | Zakrytoe Aktsionernoe Obschestvo "solar Si" (RU) | 2010-04-07 | — | — | EP | disclosed |
| CN-1245329-C | Catalyst for making hydrogen of hydrogenous inorganic compound aqueous solution and hydrogen making process | DALIAN CHEMICAL PHYSICS INST (CN) | 2006-03-15 | — | — | CN | disclosed |
| CN-1565958-A | Catalyst for making hydrogen of hydrogenous inorganic compound aqueous solution and hydrogen making process | DALIAN CHEMICAL PHYSICS INST (CN) | 2005-01-19 | — | — | CN | disclosed |
| US-6743728-B2 | Method for forming shallow trench isolation | NANYA TECHNOLOGY CORPORATION (TW) | 2004-06-01 | — | — | US | disclosed |
| US-20040058549-A1 | Method for forming shallow trench isolation | NANYA TECHNOLOGY CORPORATION (TW) | 2004-03-25 | — | — | US | disclosed |
| JP-2003188253-A | METHOD FOR REMOVING INSULATING FILM FROM VIA BOTTOM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | ULVAC JAPAN LTD | 2003-07-04 | — | — | JP | disclosed |
| EP-0688309-A1 | CONTINUOUS PROCESS FOR PURIFYING PERFLUOROCHEMICAL COMPOSITIONS | MINNESOTA MINING & MFG (US) | 1995-12-27 | — | — | EP | disclosed |
| WO-1994022794-A1 | CONTINUOUS PROCESS FOR PURIFYING PERFLUOROCHEMICAL COMPOSITIONS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1994-10-13 | — | — | WO | disclosed |
| JP-H01214871-A | ELECTROPHOTOGRAPHIC SENSITIVE BODY | FUJI ELECTRIC CO LTD | 1989-08-29 | — | — | JP | disclosed |