Fluoride

Fluoride

SCHEMBL7632863

F.F.[C].[HH].[HH]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL7637704 1.00
Fluoride SCHEMBL4405777 1.00
Fluoride SCHEMBL27273 0.82
Fluoride SCHEMBL2393843 0.82
Charcoal, Activated SCHEMBL11898253 0.82
Fluoride SCHEMBL947078 0.82
Fluoride SCHEMBL155068 0.82
Charcoal, Activated SCHEMBL4145815 0.82
Charcoal, Activated SCHEMBL3432542 0.82
Charcoal, Activated SCHEMBL2794579 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020125526-A1 Semiconductor devices and processes for making them NEC CORPORATION 2002-09-12 US disclosed
US-6414352-B2 Semiconductor device having an electronically insulating layer including a nitride layer NEC CORPORATION (JP) 2002-07-02 US disclosed
US-20010019148-A1 SEMICONDUCTOR DEVICES AND PROCESSES FOR MAKING THEM NEC ELECTRONICS CORPORATION (JP) 2001-09-06 US disclosed
US-6010946-A Semiconductor device with isolation insulating film tapered and method of manufacturing the same NEC CORPORATION (JP) 2000-01-04 US disclosed
EP-0902467-A1 Isolation for semiconductor memory cell structures and processes for making them NEC CORPORATION (JP) 1999-03-17 EP disclosed