Biphenyl

Biphenyl

SCHEMBL239496

C=Cc1ccccc1.c1ccc(-c2ccccc2)cc1

nearest known ligand 0.82

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.82
TSHR P16473 1/20 0.82
TDP1 Q9NUW8 2/20 0.42
TP53 P04637 2/20 0.42
PTGS2 P35354 1/20 0.42
MAOB P27338 1/20 0.41
CYP2A6 P11509 1/20 0.41
HDAC8 Q9BY41 2/20 0.40
L3MBTL1 Q9Y468 2/20 0.39
MAPK1 P28482 1/20 0.39
LMNA P02545 1/20 0.39
CYP1A2 P05177 1/20 0.39
CYP3A4 P08684 1/20 0.39
TAAR1 Q96RJ0 1/20 0.39
HSD17B10 Q99714 1/20 0.39
NOTUM Q6P988 1/20 0.39
MMP3 P08254 1/20 0.39
BCL2L1 Q07817 1/20 0.39
POLB P06746 1/20 0.39
CA1 P00915 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Biphenyl SCHEMBL28098304 1.00 ALDH1A1 (0.82) ALDH1A1TSHRTDP1TP53PTGS2
Biphenyl SCHEMBL27348783 1.00 ALDH1A1 (0.82) ALDH1A1TSHRTDP1TP53PTGS2
Biphenyl SCHEMBL29265378 1.00 ALDH1A1 (0.82) ALDH1A1TSHRTDP1TP53PTGS2
Styrene SCHEMBL28100854 0.97 ALDH1A1 (0.78) ALDH1A1TSHRTDP1TP53PTGS2
Biphenyl SCHEMBL22322636 0.97 ALDH1A1 (0.78) ALDH1A1TSHRTDP1TP53PTGS2
Biphenyl SCHEMBL17338454 0.97 ALDH1A1 (0.78) ALDH1A1TSHRTDP1TP53PTGS2
Tannin Pyrogallol SCHEMBL28814295 0.97 ALDH1A1 (0.78) ALDH1A1TSHRTDP1TP53PTGS2
Biphenyl SCHEMBL10753063 0.92 ALDH1A1 (0.70) ALDH1A1TSHRTDP1TP53PTGS2
SCHEMBL447854 0.92 ALDH1A1 (0.68) ALDH1A1TSHRTDP1TP53PTGS2
SCHEMBL8758080 0.92 ALDH1A1 (0.68) ALDH1A1TSHRTDP1TP53PTGS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 189 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11884828-B2 Radiation curable ink jet composition and ink jet method SEIKO EPSON CORPORATION 2024-01-30 US claimed
WO-2017174358-A1 LIQUID DETERGENT COMPOSITION CONTAINING DYE TRANSFER INHIBITORS AND OPTICAL BRIGHTENERS HENKEL AG & CO. KGAA (DE) 2017-10-12 WO claimed
CN-105567454-A Antibacterial liquid laundry detergent, preparation method and applications thereof GUANGZHOU NANDA IND CO LTD 2016-05-11 CN claimed
CN-103396699-B Environment-friendly fluorescent enhanced anti-counterfeiting ink and preparation method thereof JIANGXI NUCLEAR INDUSTRY XINGZHONG TECHNOLOGY CO LTD 2014-11-26 CN claimed
CN-103468446-A Soap base surfactant-containing laundry detergent and preparation method thereof SHANXI QINGSHAN CHEMICAL CO LTD 2013-12-25 CN claimed
CN-103396699-A Environment-friendly fluorescent enhanced anti-counterfeiting ink and preparation method thereof JIANGXI NUCLEAR INDUSTRY XINGZHONG TECHNOLOGY CO LTD 2013-11-20 CN claimed
CN-102605613-A Multi-effect suede nursing agent SHANGHAI CHINASOLUNAR TECHNOLOGY DEV CO LTD 2012-07-25 CN claimed
CN-102079956-B White covering film and manufacturing method thereof SHENGYI TECHNOLOGY CO LTD 2012-06-27 CN claimed
CN-102453620-A Multifunctional laundry detergent JINBIN XIAO 2012-05-16 CN claimed
CN-102079956-A White covering film and manufacturing method thereof GUANGDONG SHENGYI SCI TECH CO 2011-06-01 CN claimed
US-12036808-B2 Ink jet recording method using temporary curing radiation SEIKO EPSON CORPORATION (JP) 2024-07-16 US disclosed
CN-115894449-B Spiro organic compound and application thereof in organic photoelectric device 广州追光科技有限公司 2024-07-02 CN disclosed
US-20240181794-A1 Ink Jet Method And Ink Jet Apparatus SEIKO EPSON CORP (JP) 2024-06-06 US disclosed
US-11912051-B2 Ink jet method and ink jet apparatus SEIKO EPSON CORPORATION (JP) 2024-02-27 US disclosed
CN-112236434-B Polycyclic compound and organic light emitting device including the same 株式会社LG化学 2024-02-23 CN disclosed
CN-1170014-A Thermoplastic polykura resin composition POLYPLASTICS CO (JP) 1998-01-14 CN disclosed
US-5645901-A RESIN SUBSTRATE, CURED COATING LAMINATED TO SUBSTRATE, SILOXANE CURED COATING CONTAINING FINE SILICA PARTICLES, AND INDIUM TIN OXIDE FILM SHARP KABUSHIKI KAISHA (JP) 1997-07-08 US disclosed
CN-1147496-A Preparation of diarylethanes BASF AG (DE) 1997-04-16 CN disclosed
EP-0649047-A1 PLASTIC OPTICAL ARTICLE AND PROCESS FOR PRODUCING THE SAME TORAY INDUSTRIES, INC. (JP) 1995-04-19 EP disclosed
US-4791183-A 1,2-DIHALOETHYL STYRENES ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1988-12-13 US disclosed