⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8744952 | 0.85 | — | — | |
| SCHEMBL14861058 | 0.75 | — | — | |
| SCHEMBL8744953 | 0.75 | — | — | |
| SCHEMBL776865 | 0.72 | — | — | |
| SCHEMBL1935014 | 0.72 | — | — | |
| SCHEMBL8744923 | 0.65 | — | — | |
| SCHEMBL23305 | 0.61 | — | — | |
| SCHEMBL11777919 | 0.58 | — | — | |
| SCHEMBL43065 | 0.58 | — | — | |
| SCHEMBL11776348 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9122158-B2 | Photo-curable resin composition, photo-curable dry film, patterning process, protective film, and electric/electronic part | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-09-01 | — | — | US | disclosed |
| US-8957212-B2 | Photobase generator | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2015-02-17 | — | — | US | disclosed |
| US-20140220483-A1 | PHOTO-CURABLE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM, PATTERNING PROCESS, PROTECTIVE FILM, AND ELECTRIC/ELECTRONIC PART | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-07 | — | — | US | disclosed |
| US-20110233048-A1 | PHOTOBASE GENERATOR | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2011-09-29 | — | — | US | disclosed |
| EP-2368875-A1 | PHOTOBASE GENERATOR | Wako Pure Chemical Industries, Ltd. (JP) | 2011-09-28 | — | — | EP | disclosed |