⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21402796 | 0.91 | — | — | |
| SCHEMBL191963 | 0.82 | — | — | |
| SCHEMBL21402798 | 0.78 | — | — | |
| Alcohol SCHEMBL28681682 | 0.76 | — | — | |
| SCHEMBL2399464 | 0.74 | — | — | |
| SCHEMBL21402781 | 0.73 | — | — | |
| SCHEMBL28717554 | 0.72 | — | — | |
| SCHEMBL196449 | 0.70 | LMNA (0.32) | — | |
| SCHEMBL21112966 | 0.70 | — | — | |
| SCHEMBL2286910 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025022873-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND FINGERPRINT AUTHENTICATION DEVICE USING SAID CURED FILM | 東レ株式会社 | 2025-01-30 | — | — | WO | disclosed |
| WO-2024185458-A1 | RESIN COMPOSITION, CURED FILM, METHOD FOR PRODUCING SUBSTRATE WITH PATTERN OF CURED FILM, OPTICAL ELEMENT, AND METHOD FOR PRODUCING POLYSILOXANE | 東レ株式会社 | 2024-09-12 | — | — | WO | disclosed |
| WO-2023054226-A1 | PHOTOSENSITIVE RESIN COMPOSITION, MICROLENS | 東レ株式会社 | 2023-04-06 | — | — | WO | disclosed |
| WO-2023048062-A1 | SILOXANE RESIN COMPOSITION FOR FORMING CURED FILM, CURED FILM, AND METHOD FOR PRODUCING POLYSILOXANE | 東レ株式会社 | 2023-03-30 | — | — | WO | disclosed |
| US-20210080829-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM | TORAY INDUSTRIES, INC. (JP) | 2021-03-18 | — | — | US | disclosed |
| CN-105378615-B | The manufacturing method of touch panel negative-type photosensitive white composition, touch panel and touch panel | 东丽株式会社 | 2019-05-31 | — | — | CN | disclosed |
| US-9690197-B2 | Negative-type photosensitive white composition for touch panel, touch panel and touch panel production method | TORAY INDUSTRIES, INC. (JP) | 2017-06-27 | — | — | US | disclosed |
| US-20160161847-A1 | NEGATIVE-TYPE PHOTOSENSITIVE WHITE COMPOSITION FOR TOUCH PANEL, TOUCH PANEL AND TOUCH PANEL PRODUCTION METHOD | TORAY INDUSTRIES, INC. (JP) | 2016-06-09 | — | — | US | disclosed |
| EP-2360194-B1 | SILOXANE RESIN COMPOSITION AND PROTECTIVE FILM FOR TOUCH PANEL USING SAME | TORAY INDUSTRIES (JP) | 2015-03-11 | — | — | EP | disclosed |
| US-8492450-B2 | Siloxane resin composition and protective film for touch panel using the same | TORAY INDUSTRIES, INC. (JP) | 2013-07-23 | — | — | US | disclosed |
| US-20110230584-A1 | SILOXANE RESIN COMPOSITION AND PROTECTIVE FILM FOR TOUCH PANEL USING THE SAME | TORAY INDUSTRIES, INC. (JP) | 2011-09-22 | — | — | US | disclosed |