SCHEMBL24025950

SCHEMBL24025950

CCOCOCSc1ccc2c3c(cccc13)C(=O)N(OS(C)(=O)=O)C2=O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TYMS P04818 1/20 0.40
▸ KMT2A Q03164 7/20 0.38
▸ MEN1 O00255 6/20 0.38
▸ MAPT P10636 6/20 0.38
▸ POLB P06746 2/20 0.38
▸ L3MBTL1 Q9Y468 1/20 0.38
▸ FGFR1 P11362 2/20 0.37
▸ USP2 O75604 3/20 0.35
▸ KEAP1 Q14145 3/20 0.35
▸ NFE2L2 Q16236 3/20 0.35
▸ KDM4E B2RXH2 8/20 0.34
▸ ALDH1A1 P00352 8/20 0.34
▸ LMNA P02545 3/20 0.34
▸ CYP1B1 Q16678 2/20 0.34
▸ ATM Q13315 2/20 0.34
▸ HPGD P15428 5/20 0.34
▸ HTT P42858 3/20 0.34
▸ CYP1A2 P05177 1/20 0.33
▸ CYP3A4 P08684 1/20 0.33
▸ CYP2C9 P11712 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17617835 0.83 KMT2A (0.41) TYMSKMT2AMEN1MAPTPOLB
SCHEMBL26068490 0.82 FGFR1 (0.48) TYMSKMT2AMEN1MAPTPOLB
SCHEMBL18957987 0.80 MAPT (0.41) TYMSKMT2AMEN1MAPTPOLB
SCHEMBL17617857 0.79 MAPT (0.45) TYMSKMT2AMEN1MAPTPOLB
SCHEMBL17617846 0.79 KMT2A (0.40) TYMSKMT2AMEN1MAPTPOLB
SCHEMBL17617849 0.79 KMT2A (0.40) TYMSKMT2AMEN1MAPTPOLB
SCHEMBL13829357 0.78 MEN1 (0.37) TYMSKMT2AMEN1MAPTPOLB
SCHEMBL17617854 0.77 KMT2A (0.37) TYMSKMT2AMEN1MAPTPOLB
SCHEMBL17617860 0.77 TYMS (0.48) TYMSKMT2AMEN1MAPTPOLB
SCHEMBL17617868 0.76 MAPT (0.41) TYMSKMT2AMEN1MAPTPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11803122-B2 Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound TOKYO OHKA KOGYO CO., LTD. (JP) 2023-10-31 — — US disclosed
US-11803122-B2 Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound TOKYO OHKA KOGYO CO., LTD. (JP) 2023-10-31 — — US disclosed
US-20210356863-A1 CHEMICAL AMPLIFICATION-TYPE PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF PATTERNED RESIST LAYER, PRODUCTION METHOD OF PLATED MOLDED ARTICLE, COMPOUND, AND PRODUCTION METHOD OF COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2021-11-18 — — US disclosed
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