Rhodanine

Rhodanine

SCHEMBL2403229

O=C1CSC(=S)N1.[Cu]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Rhodanine SCHEMBL2229918 0.97 GSK3A (1.00) —
Rhodanine SCHEMBL55625 0.97 — —
Rhodanine SCHEMBL94126 0.97 — —
Rhodanine SCHEMBL1369265 0.95 — —
Rhodanine SCHEMBL10704409 0.95 — —
Rhodanine SCHEMBL1461756 0.95 — —
Rhodanine SCHEMBL5919491 0.95 — —
Rhodanine SCHEMBL11436580 0.95 — —
Rhodanine SCHEMBL8017015 0.95 — —
Rhodanine SCHEMBL5511180 0.95 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115700898-A Low cost wafer level package and silicon 意法半导体有限公司 2023-02-07 — — CN disclosed
CN-218333690-U Wafer level package 意法半导体有限公司 2023-01-17 — — CN disclosed
CN-109952351-B Antifouling coating composition and coated article having antifouling coating film formed on surface thereof 日东化成株式会社 2021-07-30 — — CN disclosed
CN-110691824-B Antifouling coating composition and coated article having antifouling coating film formed on surface thereof 日东化成株式会社 2021-05-25 — — CN disclosed
CN-110691824-A Antifouling coating composition and coated article having antifouling coating film formed on surface thereof 日东化成株式会社 2020-01-14 — — CN disclosed
US-20190352514-A1 ANTIFOULING COATING COMPOSITION MITSUBISHI CHEMICAL CORPORATION (JP) 2019-11-21 — — US disclosed
CN-102821872-A Method for forming antifouling coating film NIPPON PAINT MARINE COATINGS CO LTD 2012-12-12 — — CN disclosed
US-20110229879-A1 METHODS AND COMPOSITIONS FOR NUCLEAR STAINING UNIVERSITY OF ROCHESTER (US) 2011-09-22 — — US disclosed
WO-2001079359-A2 GUANIDINIUM AND ISOTHIOURONIUM COMPOUNDS AND METHODS FOR THEIR USE UNIVERSITY OF VICTORIA INNOVATION AND DEVELOPMENT CORPORATION (CA) 2001-10-25 — — WO disclosed
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