Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | EPHX2 | P34913 | 9/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.32 |
| ▸ | CNR1 | P21554 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | GRIN2D | O15399 | 2/20 | 0.31 |
| ▸ | GRIN3B | O60391 | 2/20 | 0.31 |
| ▸ | GRIN1 | Q05586 | 2/20 | 0.31 |
| ▸ | GRIN2A | Q12879 | 2/20 | 0.31 |
| ▸ | GRIN2B | Q13224 | 2/20 | 0.31 |
| ▸ | GRIN2C | Q14957 | 2/20 | 0.31 |
| ▸ | GRIN3A | Q8TCU5 | 2/20 | 0.31 |
| ▸ | P2RX7 | Q99572 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19042245 | 0.72 | ALDH1A1 (0.41) | ALDH1A1TSHREPHX2HSD17B10KMT2A | |
| SCHEMBL27436716 | 0.71 | GRIN2D (0.54) | ALDH1A1EPHX2GRIN2DGRIN3BGRIN1 | |
| SCHEMBL26366979 | 0.71 | EPHX2 (0.38) | ALDH1A1EPHX2KMT2AMEN1P2RX7 | |
| SCHEMBL22374210 | 0.66 | DPP4 (0.34) | ALDH1A1CNR1 | |
| SCHEMBL28746624 | 0.66 | EPHX2 (0.42) | EPHX2KMT2AMEN1GRIN2DGRIN3B | |
| SCHEMBL1677810 | 0.66 | EPHX2 (0.46) | EPHX2KMT2AMEN1GRIN2DGRIN3B | |
| Hydrochloric Acid SCHEMBL1677838 | 0.66 | EPHX2 (0.42) | EPHX2KMT2AMEN1GRIN2DGRIN3B | |
| Hydrochloric Acid SCHEMBL1677949 | 0.65 | EPHX2 (0.41) | EPHX2KMT2AMEN1GRIN2DGRIN3B | |
| SCHEMBL15114272 | 0.60 | KMT2A (0.41) | ALDH1A1TSHREPHX2HSD17B10KMT2A | |
| SCHEMBL19050232 | 0.59 | KDM4E (0.31) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11187980-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-11-30 | — | — | US | disclosed |