Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN22 | Q9Y2R2 | 1/20 | 0.52 |
| ▸ | TRPM4 | Q8TD43 | 1/20 | 0.52 |
| ▸ | NQO2 | P16083 | 1/20 | 0.50 |
| ▸ | CASP6 | P55212 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.48 |
| ▸ | CYP1A2 | P05177 | 4/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.48 |
| ▸ | HPGD | P15428 | 3/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.48 |
| ▸ | MEN1 | O00255 | 2/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.48 |
| ▸ | GLA | P06280 | 1/20 | 0.48 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.48 |
| ▸ | NQO1 | P15559 | 1/20 | 0.47 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.47 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.46 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.46 |
| ▸ | HTR2A | P28223 | 1/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.44 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL437148 | 0.95 | PTPN22 (0.56) | PTPN22TRPM4NQO2CASP6ALDH1A1 | |
| Propane SCHEMBL243407 | 0.92 | PTPN22 (0.50) | PTPN22TRPM4NQO2CASP6ALDH1A1 | |
| SCHEMBL29180044 | 0.92 | PTPN22 (0.54) | PTPN22TRPM4NQO2CASP6ALDH1A1 | |
| Hydrogen Sulfide SCHEMBL27992660 | 0.92 | PTPN22 (0.54) | PTPN22TRPM4NQO2CASP6ALDH1A1 | |
| Methane SCHEMBL2327641 | 0.92 | PTPN22 (0.54) | PTPN22TRPM4NQO2CASP6ALDH1A1 | |
| Methane SCHEMBL155047 | 0.92 | PTPN22 (0.54) | PTPN22TRPM4NQO2CASP6ALDH1A1 | |
| Butane SCHEMBL241215 | 0.88 | PTPN22 (0.46) | PTPN22TRPM4NQO2CASP6ALDH1A1 | |
| SCHEMBL11757019 | 0.85 | PTPN22 (0.48) | PTPN22TRPM4NQO2CASP6ALDH1A1 | |
| SCHEMBL31320895 | 0.83 | PTPN22 (0.46) | PTPN22TRPM4NQO2CASP6ALDH1A1 | |
| Ethane SCHEMBL28303517 | 0.83 | TRPM4 (0.58) | PTPN22TRPM4NQO2CASP6ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 61 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1478681-A4 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INT INC (US) | 2006-10-11 | — | — | EP | claimed |
| EP-1478681-A1 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | Honeywell International, Inc. (US) | 2004-11-24 | — | — | EP | claimed |
| WO-2003044077-A1 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | claimed |
| EP-1695142-B1 | ANTIREFLECTIVE COATINGS FOR VIA FILL AND PHOTOLITHOGRAPHY APPLICATIONS AND METHODS OF PREPARATION THEREOF | HONEYWELL INT INC (US) | 2019-07-31 | — | — | EP | disclosed |
| CN-103627316-B | ARC of filling perforation and photoetching and preparation method thereof | 霍尼韦尔国际公司 | 2016-08-03 | — | — | CN | disclosed |
| CN-105199711-A | Application of carbazole derivative as triboluminescence material to manufacturing of pressure-sensitive luminophor or pressure sensor | UNIV HENAN NORMAL | 2015-12-30 | — | — | CN | disclosed |
| US-9069133-B2 | Anti-reflective coating for photolithography and methods of preparation thereof | HONEYWELL INTERNATIONAL INC. (US) | 2015-06-30 | — | — | US | disclosed |
| US-8992806-B2 | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof | HONEYWELL INTERNATIONAL INC. (US) | 2015-03-31 | — | — | US | disclosed |
| US-8889334-B2 | Spin-on anti-reflective coatings for photolithography | HONEYWELL INTERNATIONAL INC. (US) | 2014-11-18 | — | — | US | disclosed |
| US-20140227538-A1 | Anti-Reflective Coating for Photolithography and Methods of Preparation Thereof | HONEYWELL INTERNATIONAL INC. (US) | 2014-08-14 | — | — | US | disclosed |
| CN-103627316-A | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof | HONEYWELL INT INC | 2014-03-12 | — | — | CN | disclosed |
| WO-2003044077-A1 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | disclosed |
| WO-2003044078-A1 | ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | disclosed |
| WO-2003044600-A1 | SPIN-ON ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | disclosed |
| US-6489432-B2 | POLYACETAL FORMED BY THE ACETALIZATION OF A POLYACRYLEIN WITH AN ALCOHOL; REACTION WITH A CROSSLINKING AGENT, ESPECIALLY AN ANTHRACENYLMETHYL ACRYLATE-HYDROXYALKYL ACRYLATE COPOLYMER; SEMICONDUCTOR COATINGS | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-12-03 | — | — | US | disclosed |
| US-20020132183-A1 | Organic anti-reflective coating material and its preparation | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-09-19 | — | — | US | disclosed |
| US-20020095018-A1 | Spin-on-glass anti-reflective coatings for photolithography | HONEYWELL INTERNATIONAL INC. | 2002-07-18 | — | — | US | disclosed |
| US-6368768-B1 | ACRYLATE ESTER COPOLYMER | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-04-09 | — | — | US | disclosed |
| US-20010049429-A1 | Organic anti-reflective coating polymer and preparation thereof | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2001-12-06 | — | — | US | disclosed |
| CN-1301778-A | Organic anti-reflective paint polymer and its preparing method | HYUNDAI ELECTRONICS IND (KR) | 2001-07-04 | — | — | CN | disclosed |