Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.43 |
| ▸ | HTT | P42858 | 3/20 | 0.42 |
| ▸ | LMNA | P02545 | 3/20 | 0.40 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.40 |
| ▸ | POLB | P06746 | 2/20 | 0.35 |
| ▸ | GLA | P06280 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | CNR2 | P34972 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | P2RX7 | Q99572 | 1/20 | 0.34 |
| ▸ | P2RX2 | Q9UBL9 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14925599 | 0.76 | ALDH1A1 (0.53) | ALDH1A1HTTLMNANPSR1POLB | |
| SCHEMBL26453042 | 0.72 | ALDH1A1 (0.49) | ALDH1A1HTTLMNANPSR1POLB | |
| SCHEMBL24758464 | 0.72 | ALDH1A1 (0.50) | ALDH1A1HTTLMNAPOLBGLA | |
| SCHEMBL25765152 | 0.72 | ALDH1A1 (0.57) | ALDH1A1HTTLMNANPSR1POLB | |
| SCHEMBL18308551 | 0.71 | ALDH1A1 (0.45) | ALDH1A1HTTLMNANPSR1POLB | |
| SCHEMBL27444946 | 0.69 | ALDH1A1 (0.58) | ALDH1A1HTTLMNANPSR1POLB | |
| SCHEMBL22171039 | 0.69 | POLB (0.42) | ALDH1A1HTTLMNANPSR1POLB | |
| SCHEMBL22548652 | 0.68 | ALDH1A1 (0.45) | ALDH1A1HTTLMNAGLAKDM4E | |
| SCHEMBL26459717 | 0.68 | ALDH1A1 (0.41) | ALDH1A1HTTLMNANPSR1POLB | |
| SCHEMBL22548406 | 0.67 | ALDH1A1 (0.47) | ALDH1A1HTTLMNAGLAKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3919980-A1 | ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM Corporation (JP) | 2021-12-08 | — | — | EP | disclosed |