SCHEMBL2408554

SCHEMBL2408554

C1=CC2=CCCCC2=CC1

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12520638 0.93 JAK2 (0.30)
SCHEMBL28754060 0.86
SCHEMBL11100936 0.84 JAK2 (0.33) ALDH1A1
SCHEMBL28913768 0.71
SCHEMBL7647448 0.71 TYMP (0.32) ALDH1A1
SCHEMBL25422696 0.70
SCHEMBL5548707 0.68 SIGMAR1 (0.42) ALDH1A1
SCHEMBL12521010 0.67
SCHEMBL5567656 0.67
SCHEMBL12521069 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118139910-A Linear block copolymers and curable thermosetting compositions comprising the same 高新特殊工程塑料全球技术有限公司 2024-06-04 CN disclosed
CN-115335431-B Modified poly (phenylene ether) copolymers, compositions and methods 高新特殊工程塑料全球技术有限公司 2024-05-24 CN disclosed
CN-117255812-A Blocked bisphenol polydiindane oligomers and compositions, methods of manufacture, and articles made therefrom 高新特殊工程塑料全球技术有限公司 2023-12-19 CN disclosed
US-8691496-B2 Method for forming resist under layer film, pattern forming method and composition for resist under layer film JSR CORPORATION (JP) 2014-04-08 US disclosed
US-20130004900-A1 METHOD FOR FORMING RESIST UNDER LAYER FILM, PATTERN FORMING METHOD AND COMPOSITION FOR RESIST UNDER LAYER FILM JSR CORPORATION (JP) 2013-01-03 US disclosed
US-8288073-B2 Pattern forming method JSR CORPORATION (JP) 2012-10-16 US disclosed
US-8021578-B2 Fused thiophene acenes and organic semiconductors made therefrom E. I. DU PONT DE NEMOURS AND COMPANY (US) 2011-09-20 US disclosed
US-20100028802-A1 METHOD FOR RESIST UNDER LAYER FILM FORMATION, COMPOSITION FOR RESIST UNDER LAYER FILM FOR USE IN THE METHOD, AND METHOD FOR PATTERN FORMATION JSR CORPORATION (JP) 2010-02-04 US disclosed
US-20090166590-A1 FUSED THIOPHENE ACENES AND ORGANIC SEMICONDUCTORS MADE THEREFROM E. I. DU PONT DE NEMOURS AND COMPANY (US) 2009-07-02 US disclosed
EP-1676615-B1 Solid phase sorbent POLYMERICS GMBH (DE) 2009-03-11 EP disclosed
US-7304017-B2 Sorbent for use in process of solid phase extraction POLYMERICS GMBH (DE) 2007-12-04 US disclosed
EP-1676615-A1 Solid phase sorbent Polymerics GmbH (DE) 2006-07-05 EP disclosed
US-20060138052-A1 Sorbent and process of solid phase extraction POLYMERICS GMBH (DE) 2006-06-29 US disclosed
US-5334674-A Polyhydroxy aromatic compounds, epoxy resins derived therefrom and epoxy resin compositions DAI-ICHI KOGYO SEIYAKU CO., LTD. (JP) 1994-08-02 US disclosed
US-4350534-A Fluid, stable formulations of copper phthalocyanine or indanthrone BASF AKTIENGESELLSCHAFT (DE) 1982-09-21 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090166590-A1 FUSED THIOPHENE ACENES AND ORGANIC SEMICONDUCTORS MADE THEREFROM ACE2, ACE, DDT ALDH1A1 513/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.