SCHEMBL2408575

SCHEMBL2408575

Cc1cc(C(c2cccc(O)c2)c2ccc(O)c(C)c2)ccc1O

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B1 P14061 6/20 0.53
HSD17B2 P37059 6/20 0.53
CYP2C19 P33261 3/20 0.46
CYP3A4 P08684 2/20 0.46
CYP2D6 P10635 2/20 0.46
ADRB1 P08588 2/20 0.44
ADRA1A P35348 2/20 0.44
MIF P14174 1/20 0.44
HTR2A P28223 1/20 0.44
HTR2B P41595 1/20 0.44
HIF1A Q16665 3/20 0.42
ESR2 Q92731 2/20 0.42
ESR1 P03372 1/20 0.42
ADRB2 P07550 1/20 0.42
HTR1A P08908 1/20 0.42
ADRA2A P08913 1/20 0.42
ADRB3 P13945 1/20 0.42
TSHR P16473 1/20 0.42
ADRA2B P18089 1/20 0.42
ADRA2C P18825 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1758073 0.90 TP53 (0.46) HSD17B1HSD17B2CYP2C19CYP3A4CYP2D6
SCHEMBL29465801 0.86 TP53 (0.54) HSD17B1HSD17B2CYP2C19CYP3A4CYP2D6
SCHEMBL674987 0.86 TP53 (0.54) HSD17B1HSD17B2CYP2C19CYP3A4CYP2D6
SCHEMBL23121514 0.85 ESR1 (0.47) HSD17B1HSD17B2CYP2C19CYP3A4CYP2D6
SCHEMBL31620715 0.85 ESR1 (0.47) HSD17B1HSD17B2CYP2C19CYP3A4CYP2D6
SCHEMBL2031810 0.85 ESR1 (0.47) HSD17B1HSD17B2CYP2C19CYP3A4CYP2D6
SCHEMBL1596751 0.84 TP53 (0.52) HSD17B1HSD17B2CYP2C19CYP3A4CYP2D6
SCHEMBL27176516 0.84 ESR2 (0.43) HSD17B1HSD17B2CYP2C19ESR2ESR1
SCHEMBL29375872 0.83 ADRB1 (0.46) HSD17B1HSD17B2CYP3A4ADRB1ADRA1A
SCHEMBL758072 0.83 ADRB1 (0.46) HSD17B1HSD17B2CYP3A4ADRB1ADRA1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107561863-B Positive photosensitive resin composition and application thereof 奇美实业股份有限公司 2022-09-16 CN disclosed
CN-113260921-A Photosensitive resin composition, dry film, photosensitive dry film, resist film, substrate with mold, and method for producing plated molded article 东京应化工业株式会社 2021-08-13 CN disclosed
US-20110210407-A1 DOUBLE-FACED ADHESIVE FILM AND ELECTRONIC COMPONENT MODULE USING SAME HITACHI CHEMICAL COMPANY, LTD. (JP) 2011-09-01 US disclosed
US-6316170-B2 COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT KABUSHIKI KAISHA TOSHIBA (JP) 2001-11-13 US disclosed
US-20010006767-A1 Developing solution and method of forming polyimide pattern by using the developing solution YOSHIAKI KAWAMONZEN 2001-07-05 US disclosed