SCHEMBL24110786

SCHEMBL24110786

COc1cc(O)c(I)cc1O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOB P27338 1/20 0.46
HTT P42858 2/20 0.42
CGAS Q8N884 1/20 0.42
HPGD P15428 3/20 0.42
CYP3A4 P08684 3/20 0.42
MAPT P10636 2/20 0.42
KDM4E B2RXH2 1/20 0.42
LMNA P02545 1/20 0.42
RECQL P46063 1/20 0.42
HSD17B10 Q99714 1/20 0.42
ALDH1A1 P00352 3/20 0.41
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
TP53 P04637 2/20 0.41
TSHR P16473 2/20 0.41
CYP1A2 P05177 1/20 0.41
CYP2D6 P10635 1/20 0.41
MAPK1 P28482 1/20 0.41
TRPV1 Q8NER1 1/20 0.41
SLC22A6 Q4U2R8 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4662662 0.86 CYP3A4 (0.44) MAOBHTTHPGDCYP3A4MAPT
SCHEMBL3921025 0.86 CYP3A4 (0.44) MAOBHTTHPGDCYP3A4MAPT
SCHEMBL21614376 0.86 ACHE (0.43) MAOBHTTHPGDCYP3A4MAPT
SCHEMBL69624 0.84 MAOB (0.59) MAOBHTTHPGDCYP3A4MAPT
SCHEMBL5744783 0.82 MAOB (0.43) MAOBHTTCGASHPGDCYP3A4
SCHEMBL3850148 0.80 CGAS (0.42) MAOBHTTCGASHPGDCYP3A4
SCHEMBL2911478 0.80 MAOB (0.42) MAOBCGASHPGDCYP3A4LMNA
SCHEMBL11233383 0.79 MAOB (0.54) MAOBHTTHPGDCYP3A4MAPT
SCHEMBL1402467 0.79 MAOB (0.54) MAOBHTTHPGDCYP3A4MAPT
SCHEMBL357190 0.76 TTR (0.44) HTTHPGDLMNAHSD17B10MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 US disclosed
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 US disclosed
US-20210389672-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-12-16 US disclosed