⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11060536 | 1.00 | ALDH1A1 (0.56) | — | |
| SCHEMBL4002515 | 1.00 | ALDH1A1 (0.56) | — | |
| SCHEMBL28307391 | 1.00 | ALDH1A1 (0.56) | — | |
| Methyl Alcohol SCHEMBL3842726 | 0.97 | ALDH1A1 (0.54) | — | |
| SCHEMBL29159554 | 0.97 | — | — | |
| SCHEMBL5862125 | 0.97 | — | — | |
| SCHEMBL9860399 | 0.97 | — | — | |
| SCHEMBL4406443 | 0.97 | — | — | |
| SCHEMBL4412526 | 0.97 | — | — | |
| Acetone SCHEMBL9495889 | 0.97 | ALDH1A1 (0.54) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 60576 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260147279-A1 | DEVELOPER COMPOSITION FOR METAL-CONTAINING PHOTORESIST, AND METHOD OF FORMING PATTERNS INCLUDING DEVELOPING METHOD USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2026-05-28 | — | — | US | claimed |
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | claimed |
| CN-122095033-A | Formulations | — | 2026-05-26 | — | — | CN | claimed |
| US-20260142183-A1 | Protected Sulfur Cathode for Alkali Metal-Sulfur Secondary Battery and Manufacturing Method | HONEYCOMB BATTERY COMPANY (US) | 2026-05-21 | — | — | US | claimed |
| WO-2026104328-A1 | FORMULATION | MERCK PATENT GMBH (DE) | 2026-05-21 | — | — | WO | claimed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | claimed |
| EP-4072992-B1 | COMPOSITION | SAMSUNG ELECTRONICS CO LTD (KR) | 2026-04-08 | — | — | EP | claimed |
| CN-121578590-A | Composition for forming lower layer film of patterning material and lower layer film of patterning material | 珠海基石科技有限公司 | 2026-02-27 | — | — | CN | claimed |
| US-20260010073-A1 | PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2026-01-08 | — | — | US | claimed |
| EP-4673230-A1 | FILM FORMING ORAL CARE COMPOSITIONS AND METHODS FOR THE SAME | Colgate-Palmolive Company (US) | 2026-01-07 | — | — | EP | claimed |
| US-4017435-A | POLYESTERS | KANSAI PAINT COMPANY, LTD. (JA) | 1977-04-12 | — | — | US | claimed |
| US-4007146-A | POLYESTER | NITTO ELECTRIC INDUSTRIAL CO., LTD. (JA) | 1977-02-08 | — | — | US | claimed |
| US-3996336-A | AZEOTROPES; DISTILLATION; PRECIPITATION OF RESIDUES | HOECHST AKTIENGESELLSCHAFT (DT) | 1976-12-07 | — | — | US | claimed |
| US-3992346-A | POLYESTER BINDERS | BADISCHE ANILIN- & SODA-FABRIK AKTIENGESELLSCHAFT (DT) | 1976-11-16 | — | — | US | claimed |
| US-3984582-A | Method for preparing positive resist image | IBM (US) | 1976-10-05 | — | — | US | claimed |
| US-3970621-A | BISPHENOL-EPICHLOROHYDRIN EPOXY RESIN | KANSAI PAINT COMPANY, LTD. (JA) | 1976-07-20 | — | — | US | claimed |
| US-3966663-A | TETRABROMO COMPOUND | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE ARMY (US) | 1976-06-29 | — | — | US | claimed |
| US-3960791-A | ACRYLIC RESIN | KANSAI PAINT COMPANY, LTD. (JA) | 1976-06-01 | — | — | US | claimed |
| US-3956406-A | Purification of trimethylolpropane | EASTMAN KODAK COMPANY (US) | 1976-05-11 | — | — | US | claimed |
| US-3953164-A | NYLON CARPET, SHRINKING | CONGOLEUM INDUSTRIES, INC. (US) | 1976-04-27 | — | — | US | claimed |