SCHEMBL24208043

SCHEMBL24208043

C=C(C)C(=O)OC1(C(=C)C)CCC(C)CC1

nearest known ligand 0.34

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24207760 0.81 ALDH1A1 (0.39) ALDH1A1
SCHEMBL13713816 0.80 ALDH1A1 (0.35) ALDH1A1
SCHEMBL24189514 0.78 ALDH1A1 (0.41) ALDH1A1
SCHEMBL4401703 0.76 TSHR (0.34) ALDH1A1
SCHEMBL13713815 0.76 ALDH1A1 (0.34) ALDH1A1
SCHEMBL22866029 0.75 ALDH1A1 (0.34) ALDH1A1
SCHEMBL26226715 0.74 HMGCR (0.30)
SCHEMBL23494212 0.74 ALDH1A1 (0.33) ALDH1A1
SCHEMBL4401685 0.73 TSHR (0.33) ALDH1A1
SCHEMBL4406125 0.71 TSHR (0.38) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11754922-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2023-09-12 US disclosed
US-11754922-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2023-09-12 US disclosed
US-20220019142-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2022-01-20 US disclosed