SCHEMBL24244841

SCHEMBL24244841

CCN(CCOCCOCCNC(C)=O)C(C)=O

nearest known ligand 0.40

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
MTNR1A P48039 5/20 0.36
MTNR1B P49286 5/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
MAPK1 P28482 2/20 0.35
KDM4E B2RXH2 1/20 0.35
HIF1A Q16665 1/20 0.35
CHRM2 P08172 1/20 0.35
ALDH1A1 P00352 2/20 0.35
TSHR P16473 2/20 0.33
PAOX Q6QHF9 1/20 0.33
USP2 O75604 1/20 0.33
ALOX15 P16050 1/20 0.33
HSD17B10 Q99714 1/20 0.33
CYP1A2 P05177 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9287610 0.80 KDM4E (0.44) MTNR1AMTNR1BSMN1; SMN2MAPK1KDM4E
SCHEMBL5155263 0.80 MEN1 (0.56) MEN1KMT2AMTNR1AMTNR1BSMN1; SMN2
SCHEMBL19309079 0.80 MEN1 (0.56) MEN1KMT2AMTNR1AMTNR1BSMN1; SMN2
SCHEMBL25816846 0.79 MEN1 (0.44) MEN1KMT2AMTNR1AMTNR1BSMN1; SMN2
SCHEMBL25817408 0.79 MEN1 (0.44) MEN1KMT2AMTNR1AMTNR1BSMN1; SMN2
SCHEMBL5157716 0.78 MAPK1 (0.55) MEN1KMT2AMTNR1AMTNR1BSMN1; SMN2
SCHEMBL13588478 0.77 TSHR (0.40) MEN1KMT2AMAPK1ALDH1A1TSHR
SCHEMBL25816562 0.77 SMN1; SMN2 (0.44) MEN1KMT2AMTNR1AMTNR1BSMN1; SMN2
SCHEMBL15224094 0.76 MEN1 (0.48) MEN1KMT2AMTNR1AMTNR1BSMN1; SMN2
SCHEMBL21771222 0.76 MEN1 (0.48) MEN1KMT2AMTNR1AMTNR1BSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11809077-B2 Photoresist compositions and pattern formation methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2023-11-07 US disclosed
US-20220043342-A1 PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2022-02-10 US disclosed