SCHEMBL24254768

SCHEMBL24254768

Cc1c(F)c(F)c(-c2cc3cc4sc(-c5c(F)c(F)c(C(F)(F)F)c(F)c5F)cc4cc3s2)c(F)c1F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25165741 0.79 — —
SCHEMBL25165755 0.79 — —
SCHEMBL25165429 0.78 — —
SCHEMBL13798623 0.73 SMN1; SMN2 (0.32) —
SCHEMBL169940 0.71 SMN1; SMN2 (0.35) —
SCHEMBL26500326 0.69 — —
SCHEMBL14155958 0.68 NQO1 (0.32) —
SCHEMBL26500342 0.68 — —
SCHEMBL19756809 0.67 SMN1; SMN2 (0.33) —
SCHEMBL26500252 0.66 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4198163-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN Tosoh Corporation (JP) 2023-06-21 — — EP disclosed
WO-2022034907-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2022-02-17 — — WO disclosed
Send feedback