SCHEMBL24254783

SCHEMBL24254783

Cc1ccc2c(c1)C1(c3ccccc3-2)c2cc(N)ccc2-c2ccc(N)cc21

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 4/20 0.50
LMNA P02545 3/20 0.50
MEN1 O00255 2/20 0.50
KMT2A Q03164 2/20 0.50
KDM4E B2RXH2 2/20 0.50
MAPT P10636 2/20 0.50
OPRK1 P41145 1/20 0.50
PDK2 Q15119 8/20 0.49
NPC1 O15118 4/20 0.42
ALDH1A1 P00352 4/20 0.42
RAB9A P51151 4/20 0.42
PTPRC P08575 2/20 0.42
HPGD P15428 2/20 0.42
APAF1 O14727 1/20 0.42
TDP2 O95551 1/20 0.42
NSD2 O96028 1/20 0.42
PLA2G1B P04054 1/20 0.42
POLB P06746 1/20 0.42
CTSL P07711 1/20 0.42
ALOX12 P18054 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13326482 1.00 SMN1; SMN2 (0.50) SMN1; SMN2LMNAMEN1KMT2AKDM4E
SCHEMBL19060980 1.00 SMN1; SMN2 (0.50) SMN1; SMN2LMNAMEN1KMT2AKDM4E
SCHEMBL17789216 0.95 PDK2 (0.51) SMN1; SMN2LMNAMEN1KMT2AKDM4E
SCHEMBL16656144 0.91 ACHE (0.42) SMN1; SMN2LMNAMEN1KMT2AKDM4E
SCHEMBL11886620 0.91 ACHE (0.42) SMN1; SMN2LMNAMEN1KMT2AKDM4E
SCHEMBL12681944 0.91 ACHE (0.42) SMN1; SMN2LMNAMEN1KMT2AKDM4E
SCHEMBL196364 0.89 SMN1; SMN2 (0.61) SMN1; SMN2LMNAMEN1KMT2AKDM4E
SCHEMBL29571766 0.89 SMN1; SMN2 (0.61) SMN1; SMN2LMNAMEN1KMT2AKDM4E
SCHEMBL15695611 0.89 SMN1; SMN2 (0.61) SMN1; SMN2LMNAMEN1KMT2AKDM4E
SCHEMBL808149 0.89 SMN1; SMN2 (0.61) SMN1; SMN2LMNAMEN1KMT2AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022034907-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2022-02-17 WO disclosed