SCHEMBL24254785

SCHEMBL24254785

Nc1ccc2c(c1)cc(N)c1cc(N)ccc12

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPRT1 P00492 1/20 0.43
PLAU P00749 2/20 0.42
ALDH1A1 P00352 5/20 0.41
CYP3A4 P08684 2/20 0.41
HSD17B10 Q99714 2/20 0.41
PARP1 P09874 1/20 0.39
CASP1 P29466 2/20 0.39
ALOX15 P16050 1/20 0.39
CASP7 P55210 1/20 0.39
HBB P68871 1/20 0.39
HIF1A Q16665 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
CASP6 P55212 2/20 0.39
NSD2 O96028 1/20 0.39
DUSP3 P51452 1/20 0.39
PTPN5 P54829 1/20 0.39
PTPN11 Q06124 1/20 0.39
MAPT P10636 4/20 0.38
KDM4E B2RXH2 4/20 0.38
MEN1 O00255 3/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14742649 0.88 HPRT1 (0.58) HPRT1PLAUALDH1A1CYP3A4HSD17B10
SCHEMBL16107467 0.86 HPRT1 (0.61) HPRT1PLAUALDH1A1CYP3A4HSD17B10
SCHEMBL21499706 0.86 HPRT1 (0.43) HPRT1PLAUALDH1A1CYP3A4HSD17B10
SCHEMBL16107470 0.85 HPRT1 (0.59) HPRT1PLAUALDH1A1CYP3A4HSD17B10
SCHEMBL29389942 0.80 PLAU (0.45) HPRT1PLAUALDH1A1CYP3A4HSD17B10
SCHEMBL678473 0.80 PLAU (0.45) HPRT1PLAUALDH1A1CYP3A4HSD17B10
SCHEMBL29463756 0.80 PLAU (0.45) HPRT1PLAUALDH1A1CYP3A4HSD17B10
SCHEMBL8121539 0.79 ALDH1A1 (0.55) HPRT1PLAUALDH1A1CYP3A4HSD17B10
SCHEMBL25121391 0.77 PLAU (0.53) PLAUALDH1A1CYP3A4HSD17B10PARP1
SCHEMBL21409802 0.77 PLAU (0.44) HPRT1PLAUALDH1A1CYP3A4HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022034907-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2022-02-17 WO disclosed