SCHEMBL24254867

SCHEMBL24254867

Fc1c(F)c(C(F)(F)F)c(F)c(F)c1N(c1ccc(-c2ccc(N(c3c(F)c(F)c(C(F)(F)F)c(F)c3F)c3c(F)c(F)c4c(F)c(F)c(F)c(F)c4c3F)cc2C(F)(F)F)c(C(F)(F)F)c1)c1c(F)c(F)c2c(F)c(F)c(F)c(F)c2c1F

nearest known ligand 0.34

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
GLA P06280 1/20 0.34
POLB P06746 1/20 0.34
GAA P10253 1/20 0.34
TSHR P16473 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24254761 0.87 GLA (0.35) GLAPOLBGAATSHR
SCHEMBL24254869 0.84
SCHEMBL25638318 0.84 GLA (0.31) GLAPOLBGAATSHR
SCHEMBL25641677 0.81 GLA (0.31) GLAPOLBGAATSHR
SCHEMBL24254858 0.78 PTGDR2 (0.31)
SCHEMBL24254860 0.78 GLA (0.37) GLAPOLBGAATSHR
SCHEMBL24254859 0.76 PTGDR2 (0.31)
SCHEMBL24254876 0.76 GLA (0.31) GLAPOLBGAATSHR
SCHEMBL24254657 0.73
SCHEMBL24254833 0.71 KIF11 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4198163-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN Tosoh Corporation (JP) 2023-06-21 EP disclosed
WO-2022034907-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2022-02-17 WO disclosed