Medronic Acid

Medronic Acid

SCHEMBL242935

CC(N)CN.O=P(O)(O)CP(=O)(O)O.O=P(O)(O)CP(=O)(O)O.O=P(O)(O)CP(=O)(O)O.O=P(O)(O)CP(=O)(O)O

nearest known ligand 0.53

Full drug profile on Sugi Atlas →

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.53
KDM4E B2RXH2 1/20 0.53
MMP2 P08253 1/20 0.53
THRB P10828 1/20 0.53
MAPK1 P28482 1/20 0.53
HSD17B10 Q99714 1/20 0.53
ANPEP P15144 6/20 0.52
ERAP2 Q6P179 1/20 0.52
TDP1 Q9NUW8 1/20 0.48
LAP3 P28838 4/20 0.46
ERAP1 Q9NZ08 1/20 0.46
OTC P00480 1/20 0.46
FDPS P14324 1/20 0.43
GABBR2 O75899 1/20 0.42
GABBR1 Q9UBS5 1/20 0.42
METAP1 P53582 1/20 0.41
GABRR1 P24046 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Medronic Acid SCHEMBL10634361 1.00 ALDH1A1 (0.53) ALDH1A1KDM4EMMP2THRBMAPK1
Medronic Acid SCHEMBL243320 1.00 ALDH1A1 (0.53) ALDH1A1KDM4EMMP2THRBMAPK1
Medronic Acid SCHEMBL28647857 0.86 KDM4E (0.62) ALDH1A1KDM4EMMP2THRBMAPK1
Phosphoric Acid SCHEMBL28858109 0.86 ALDH1A1 (0.62) ALDH1A1ANPEPERAP2TDP1LAP3
Medronic Acid SCHEMBL18066158 0.86 KDM4E (0.62) ALDH1A1KDM4EMMP2THRBMAPK1
Medronic Acid SCHEMBL1921134 0.86 KDM4E (0.62) ALDH1A1KDM4EMMP2THRBMAPK1
Phosphoric Acid SCHEMBL9014286 0.86 ALDH1A1 (0.62) ALDH1A1ANPEPERAP2TDP1LAP3
Medronic Acid SCHEMBL2383175 0.83 KDM4E (0.59) ALDH1A1KDM4EMMP2THRBMAPK1
Phosphoric Acid SCHEMBL28858086 0.81 ALDH1A1 (0.56) ALDH1A1ANPEPERAP2TDP1LAP3
SCHEMBL2849961 0.80 ALDH1A1 (0.68) ALDH1A1ANPEPERAP2TDP1LAP3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10301581-B2 Liquid composition for cleaning semiconductor device, method for cleaning semiconductor device, and method for fabricating semiconductor device MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2019-05-28 US claimed
EP-2927937-B1 CLEANING LIQUID FOR SEMICONDUCTOR ELEMENTS AND CLEANING METHOD USING SAME MITSUBISHI GAS CHEMICAL CO (JP) 2018-01-03 EP claimed
US-9803162-B2 Liquid composition for cleaning semiconductor device, and method for cleaning semiconductor device MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2017-10-31 US claimed
US-20170183607-A1 LIQUID COMPOSITION FOR CLEANING SEMICONDUCTOR DEVICE, AND METHOD FOR CLEANING SEMICONDUCTOR DEVICE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2017-06-29 US claimed
US-9422512-B2 Cleaning liquid for semiconductor elements and cleaning method using same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2016-08-23 US claimed
EP-2927937-A1 CLEANING LIQUID FOR SEMICONDUCTOR ELEMENTS AND CLEANING METHOD USING SAME Mitsubishi Gas Chemical Company, Inc. (JP) 2015-10-07 EP claimed
US-20150210966-A1 CLEANING LIQUID FOR SEMICONDUCTOR ELEMENTS AND CLEANING METHOD USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2015-07-30 US claimed
EP-2128707-B1 CLEANING COMPOSITION AND PROCESS FOR PRODUCING A SEMICONDUCTOR DEVICE MITSUBISHI GAS CHEMICAL CO (JP) 2014-04-30 EP claimed
US-7977292-B2 Cleaning composition and process for producing semiconductor device MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2011-07-12 US claimed
US-20100029085-A1 CLEANING COMPOSITION AND PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2010-02-04 US claimed
EP-2128707-A1 CLEANING COMPOSITION AND PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE Mitsubishi Gas Chemical Company, Inc. (JP) 2009-12-02 EP claimed
US-6896744-B2 Method for cleaning a surface of a substrate MITSUBISHI CHEMICAL CORPORATION (JP) 2005-05-24 US claimed
US-20040099290-A1 Method for cleaning a surface of a substrate MITSUBISHI CHEMICAL CORPORATION (JP) 2004-05-27 US claimed
EP-1389496-A1 METHOD FOR CLEANING SURFACE OF SUBSTRATE MITSUBISHI CHEMICAL CORPORATION (JP) 2004-02-18 EP claimed
JP-3088703-A None JP disclosed
US-11767595-B2 Chemical liquid, chemical liquid container, and method for treating substrate FUJIFILM CORPORATION (JP) 2023-09-26 US disclosed
WO-2023157655-A1 COMPOSITION, COMPOUND, RESIN, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE 富士フイルム株式会社 2023-08-24 WO disclosed
EP-0038183-B1 POLYPHENYLENE ETHER RESIN COMPOSITIONS AND SHAPED ARTICLES THEREOF MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1985-07-31 EP disclosed
US-4383066-A Polyphenylene ether resin composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1983-05-10 US disclosed
EP-0038183-A1 Polyphenylene ether resin compositions and shaped articles thereof MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1981-10-21 EP disclosed