SCHEMBL24313823

SCHEMBL24313823

C=CC(=O)OCC(COC(=O)CC)c1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.50
CYP2D6 P10635 2/20 0.50
PKM P14618 1/20 0.50
SMN1; SMN2 Q16637 1/20 0.50
NPSR1 Q6W5P4 1/20 0.50
TSHR P16473 3/20 0.44
THRB P10828 2/20 0.43
ALDH1A1 P00352 1/20 0.37
PRKCA P17252 1/20 0.37
PRKCD Q05655 1/20 0.37
LMNA P02545 2/20 0.36
MDM4 O15151 1/20 0.36
MAPT P10636 1/20 0.36
MDM2 Q00987 1/20 0.36
CYP2C19 P33261 1/20 0.36
HPGD P15428 1/20 0.36
KMT2A Q03164 1/20 0.36
MMP8 P22894 1/20 0.35
CHRM1 P11229 1/20 0.35
THRA P10827 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17460170 0.89 CYP2D6 (0.61) CYP1A2CYP2D6PKMSMN1; SMN2NPSR1
SCHEMBL17754531 0.87 CYP1A2 (0.50) CYP1A2CYP2D6PKMSMN1; SMN2NPSR1
SCHEMBL19817555 0.85 CYP1A2 (0.53) CYP1A2CYP2D6PKMSMN1; SMN2NPSR1
SCHEMBL22667465 0.82 TSHR (0.42) CYP1A2CYP2D6PKMSMN1; SMN2NPSR1
SCHEMBL3296254 0.80 TSHR (0.49) CYP1A2CYP2D6PKMSMN1; SMN2NPSR1
SCHEMBL27585813 0.79 CYP1A2 (0.49) CYP1A2CYP2D6PKMSMN1; SMN2NPSR1
SCHEMBL27590301 0.79 CYP1A2 (0.56) CYP1A2CYP2D6PKMSMN1; SMN2NPSR1
SCHEMBL20590330 0.79 CYP1A2 (0.45) CYP1A2CYP2D6PKMSMN1; SMN2NPSR1
SCHEMBL3169558 0.78 THRB (0.53) CYP1A2CYP2D6PKMSMN1; SMN2NPSR1
SCHEMBL22009267 0.78 CYP1A2 (0.38) CYP1A2CYP2D6PKMSMN1; SMN2NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3172247-B1 PHOTOCURABLE COMPOSITION, METHOD FOR PRODUCING CURED PRODUCT PATTERN USING THE SAME, METHOD FOR PRODUCING OPTICAL COMPONENT, AND METHOD FOR PRODUCING CIRCUIT BOARD CANON KK (JP) 2022-03-30 EP disclosed