Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR2A | P28223 | 1/20 | 0.52 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.52 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.49 |
| ▸ | POLB | P06746 | 3/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 5/20 | 0.41 |
| ▸ | HPGD | P15428 | 4/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 4/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | GLA | P06280 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | GAA | P10253 | 2/20 | 0.41 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | GPR35 | Q9HC97 | 2/20 | 0.40 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.39 |
| ▸ | TRPM4 | Q8TD43 | 1/20 | 0.39 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.38 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL241214 | 0.94 | HTR2A (0.50) | HTR2AL3MBTL1KDM4EPOLBALDH1A1 | |
| SCHEMBL2113583 | 0.92 | HTR2A (0.48) | HTR2AL3MBTL1KDM4EPOLBALDH1A1 | |
| SCHEMBL2113231 | 0.92 | HTR2A (0.48) | HTR2AL3MBTL1KDM4EPOLBALDH1A1 | |
| SCHEMBL18098077 | 0.92 | HTR2A (0.48) | HTR2AL3MBTL1KDM4EPOLBALDH1A1 | |
| SCHEMBL2314010 | 0.87 | HTR2A (0.44) | HTR2AL3MBTL1KDM4EPOLBALDH1A1 | |
| SCHEMBL240651 | 0.87 | HTR2A (0.56) | HTR2AL3MBTL1KDM4EPOLBALDH1A1 | |
| SCHEMBL7877776 | 0.87 | HTR2A (0.60) | HTR2AL3MBTL1KDM4EPOLBALDH1A1 | |
| SCHEMBL7875750 | 0.87 | HTR2A (0.60) | HTR2AL3MBTL1KDM4EPOLBALDH1A1 | |
| SCHEMBL7874386 | 0.85 | HTR2A (0.58) | HTR2AL3MBTL1KDM4EPOLBALDH1A1 | |
| SCHEMBL7877797 | 0.85 | HTR2A (0.58) | HTR2AL3MBTL1KDM4EPOLBALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1478681-A4 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INT INC (US) | 2006-10-11 | — | — | EP | claimed |
| EP-1478681-A1 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | Honeywell International, Inc. (US) | 2004-11-24 | — | — | EP | claimed |
| WO-2003044077-A1 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | claimed |
| EP-1695142-B1 | ANTIREFLECTIVE COATINGS FOR VIA FILL AND PHOTOLITHOGRAPHY APPLICATIONS AND METHODS OF PREPARATION THEREOF | HONEYWELL INT INC (US) | 2019-07-31 | — | — | EP | disclosed |
| CN-103627316-B | ARC of filling perforation and photoetching and preparation method thereof | 霍尼韦尔国际公司 | 2016-08-03 | — | — | CN | disclosed |
| US-9069133-B2 | Anti-reflective coating for photolithography and methods of preparation thereof | HONEYWELL INTERNATIONAL INC. (US) | 2015-06-30 | — | — | US | disclosed |
| US-8992806-B2 | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof | HONEYWELL INTERNATIONAL INC. (US) | 2015-03-31 | — | — | US | disclosed |
| US-8889334-B2 | Spin-on anti-reflective coatings for photolithography | HONEYWELL INTERNATIONAL INC. (US) | 2014-11-18 | — | — | US | disclosed |
| US-20140227538-A1 | Anti-Reflective Coating for Photolithography and Methods of Preparation Thereof | HONEYWELL INTERNATIONAL INC. (US) | 2014-08-14 | — | — | US | disclosed |
| US-8642246-B2 | Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof | HONEYWELL INTERNATIONAL INC. (US) | 2014-02-04 | — | — | US | disclosed |
| US-20130164677-A1 | Spin-On Anti-Reflective Coatings for Photolithography | HONEYWELL INTERNATIONAL INC. (US) | 2013-06-27 | — | — | US | disclosed |
| EP-0675410-A1 | Resist composition for deep ultraviolet light | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1995-10-04 | — | — | EP | disclosed |
| EP-0365495-B1 | 9-Anthrylalkyl compounds, their preparation and their use | EKA NOBEL AB (SE) | 1994-03-16 | — | — | EP | disclosed |
| EP-0369194-B1 | SULFONIUM SALTS AND USE AND PREPARATION THEREOF | International Business Machines Corporation (US) | 1993-07-14 | — | — | EP | disclosed |
| US-5128120-A | Use of 9-anthrylalkyl compounds as derivatization reagents for separation and detection purposes | EKA NOBEL AB (SE) | 1992-07-07 | — | — | US | disclosed |
| US-5102772-A | Photocurable epoxy composition with sulfonium salt photoinitiator | IBM (US) | 1992-04-07 | — | — | US | disclosed |
| US-5047568-A | Sulfonium salts and use and preparation thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1991-09-10 | — | — | US | disclosed |
| US-5015755-A | 9-anthrylalkyl compounds | EKA NOBEL AB (SE) | 1991-05-14 | — | — | US | disclosed |
| EP-0369194-A2 | Sulfonium salts and use and preparation thereof | International Business Machines Corporation (US) | 1990-05-23 | — | — | EP | disclosed |
| EP-0365495-A2 | 9-Anthrylalkyl compounds, their preparation and their use | Eka Nobel Aktiebolag (SE) | 1990-04-25 | — | — | EP | disclosed |