Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.50 |
| ▸ | ATM | Q13315 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 4/20 | 0.42 |
| ▸ | HPGD | P15428 | 2/20 | 0.40 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.38 |
| ▸ | NAAA | Q02083 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | FAAH | O00519 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.35 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1656042 | 0.86 | TSHR (0.56) | ALDH1A1ATMTSHRHPGDHCAR2 | |
| SCHEMBL18915848 | 0.85 | ALDH1A1 (0.59) | ALDH1A1ATMTSHRHPGDHCAR2 | |
| SCHEMBL17028805 | 0.85 | ALDH1A1 (0.59) | ALDH1A1ATMTSHRHPGDHCAR2 | |
| SCHEMBL12150098 | 0.82 | ALDH1A1 (0.50) | ALDH1A1ATMTSHRHPGDHCAR2 | |
| SCHEMBL13572188 | 0.81 | TSHR (0.64) | ALDH1A1TSHRHPGDHCAR2NAAA | |
| SCHEMBL1639253 | 0.80 | ALDH1A1 (0.42) | ALDH1A1TSHRHPGDL3MBTL1NPSR1 | |
| SCHEMBL1639255 | 0.80 | ALDH1A1 (0.42) | ALDH1A1TSHRHPGDL3MBTL1NPSR1 | |
| SCHEMBL10704587 | 0.79 | ALDH1A1 (0.47) | ALDH1A1ATMTSHRHPGDHCAR2 | |
| SCHEMBL8391017 | 0.79 | ALDH1A1 (0.47) | ALDH1A1ATMTSHRHPGDHCAR2 | |
| SCHEMBL9395280 | 0.79 | ALDH1A1 (0.47) | ALDH1A1ATMTSHRHPGDHCAR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2450412-B1 | Silicone coating composition | MERCK PATENT GMBH (DE) | 2019-08-28 | — | — | EP | disclosed |
| EP-2102156-B1 | PHOTOACTIVE COMPOUNDS | MERCK PATENT GMBH (DE) | 2019-06-26 | — | — | EP | disclosed |
| EP-2121857-B1 | SILICONE COATING COMPOSITION | AZ ELECTRONIC MATERIALS USA (US) | 2014-06-04 | — | — | EP | disclosed |
| US-8252503-B2 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2012-08-28 | — | — | US | disclosed |
| EP-2122418-B1 | STRIPPER FOR COATING LAYER | AZ ELECTRONIC MATERIALS USA (US) | 2012-08-08 | — | — | EP | disclosed |
| US-8211621-B2 | Antireflective coating compositions | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2012-07-03 | — | — | US | disclosed |
| EP-2450412-A1 | Silicone coating composition | AZ Electronic Materials USA Corp. (US) | 2012-05-09 | — | — | EP | disclosed |
| EP-2370859-A2 | A PHOTOSENSITIVE COMPOSITION | AZ Electronic Materials USA Corp. (US) | 2011-10-05 | — | — | EP | disclosed |
| US-8026040-B2 | High silicon-content resin composition used to form thin film thermosets; form low k dielectric constant materials; hard mask and underlayer materials with anti-reflective properties for photolithography industry | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2011-09-27 | — | — | US | disclosed |
| US-8026201-B2 | Comprising: a fluoride source, an organic quaternary ammonium base, and a solvent selected from an organic solvent, water, and mixtures thereof; for removing silicon-based anti-reflective coatings/hardmask layers from microelectronics; etch selectivity | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2011-09-27 | — | — | US | disclosed |
| US-20080014529-A1 | ANTIREFLECTIVE COATING COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. | 2008-01-17 | — | — | US | disclosed |
| US-20080008954-A1 | HIGH SILICON-CONTENT THIN FILM THERMOSETS | AZ ELECTRONIC MATERIALS USA CORP. | 2008-01-10 | — | — | US | disclosed |
| WO-2007148221-A1 | HIGH SILICON-CONTENT THIN FILM THERMOSETS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-12-27 | — | — | WO | disclosed |
| US-20070248913-A1 | PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. | 2007-10-25 | — | — | US | disclosed |
| WO-2007057773-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-05-24 | — | — | WO | disclosed |
| US-20070111138-A1 | Photoactive compounds | MERCK PATENT GMBH (DE) | 2007-05-17 | — | — | US | disclosed |
| WO-2007007175-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIAL USA CORP. (DE) | 2007-01-18 | — | — | WO | disclosed |
| US-20070015084-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2007-01-18 | — | — | US | disclosed |
| US-20060131240-A1 | Process for treating solvents | AZ ELECTRONIC MATERIALS USA CORP. | 2006-06-22 | — | — | US | disclosed |
| WO-2006064368-A2 | PROCESS FOR TREATING SOLVENTS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2006-06-22 | — | — | WO | disclosed |