Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.40 |
| ▸ | CA1 | P00915 | 8/20 | 0.39 |
| ▸ | CA2 | P00918 | 8/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.38 |
| ▸ | NPC1 | O15118 | 2/20 | 0.38 |
| ▸ | RAB9A | P51151 | 2/20 | 0.38 |
| ▸ | MEN1 | O00255 | 2/20 | 0.38 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.38 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.38 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.38 |
| ▸ | CA12 | O43570 | 3/20 | 0.37 |
| ▸ | CA7 | P43166 | 3/20 | 0.37 |
| ▸ | CA13 | Q8N1Q1 | 3/20 | 0.37 |
| ▸ | CA9 | Q16790 | 3/20 | 0.35 |
| ▸ | MAPT | P10636 | 4/20 | 0.33 |
| ▸ | MAOB | P27338 | 1/20 | 0.33 |
| ▸ | ENPP3 | O14638 | 2/20 | 0.32 |
| ▸ | ENPP1 | P22413 | 2/20 | 0.32 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4423397 | 1.00 | TDP1 (0.40) | TDP1CA1CA2KMT2ANPC1 | |
| Methane SCHEMBL4257313 | 0.98 | TDP1 (0.39) | TDP1CA1CA2KMT2ANPC1 | |
| Ethane SCHEMBL4847614 | 0.97 | TDP1 (0.38) | TDP1CA1CA2KMT2ANPC1 | |
| SCHEMBL2437745 | 0.95 | TDP1 (0.37) | TDP1CA1CA2KMT2ANPC1 | |
| SCHEMBL4839664 | 0.94 | CA1 (0.36) | TDP1CA1CA2KMT2ANPC1 | |
| Trifluoromethanesulfonic Acid SCHEMBL3422375 | 0.90 | CA1 (0.34) | TDP1CA1CA2KMT2ANPC1 | |
| SCHEMBL2439980 | 0.90 | CA1 (0.34) | TDP1CA1CA2KMT2ANPC1 | |
| SCHEMBL2439557 | 0.89 | CA1 (0.34) | TDP1CA1CA2KMT2ANPC1 | |
| SCHEMBL2436554 | 0.89 | CA1 (0.34) | TDP1CA1CA2KMT2ANPC1 | |
| SCHEMBL2437564 | 0.87 | CA1 (0.33) | TDP1CA1CA2KMT2ANPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2078028-B1 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA (US) | 2011-09-07 | — | — | EP | claimed |
| US-7678528-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-03-16 | — | — | US | claimed |
| EP-2078028-A1 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2009-07-15 | — | — | EP | claimed |
| WO-2008041123-A1 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-04-10 | — | — | WO | claimed |
| US-20070111138-A1 | Photoactive compounds | MERCK PATENT GMBH (DE) | 2007-05-17 | — | — | US | claimed |
| US-9146467-B2 | Coating compositions | MERCK PATENT GMBH (DE) | 2015-09-29 | — | — | US | disclosed |
| US-20130236833-A1 | COATING COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2013-09-12 | — | — | US | disclosed |
| US-7833693-B2 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | AZ ELECTRONIC MATERIALS USA CORP. | 2010-11-16 | — | — | US | disclosed |
| EP-2078028-A1 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2009-07-15 | — | — | EP | disclosed |
| US-7521170-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-04-21 | — | — | US | disclosed |
| US-20090087782-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2009-04-02 | — | — | US | disclosed |
| WO-2008041123-A1 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-04-10 | — | — | WO | disclosed |