Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.33 |
| ▸ | PPARD | Q03181 | 2/20 | 0.32 |
| ▸ | PPARG | P37231 | 1/20 | 0.32 |
| ▸ | PPARA | Q07869 | 1/20 | 0.32 |
| ▸ | FAAH | O00519 | 2/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | PDE2A | O00408 | 1/20 | 0.31 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.31 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.31 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24375704 | 0.87 | ELANE (0.42) | ELANEKMT2AATMEPHX2PPARD | |
| SCHEMBL9999348 | 0.81 | ELANE (0.50) | ELANEKMT2AATMPPARGPPARA | |
| SCHEMBL11230872 | 0.80 | ELANE (0.43) | ELANEKMT2AATMPPARDPPARG | |
| SCHEMBL26334784 | 0.80 | KMT2A (0.38) | KMT2AFAAHMAPT | |
| SCHEMBL29019507 | 0.79 | LMNA (0.49) | ELANEKMT2AATMMAPT | |
| SCHEMBL19998062 | 0.76 | ELANE (0.43) | ELANEKMT2AATMPPARDPPARG | |
| SCHEMBL12636054 | 0.76 | ELANE (0.50) | ELANEKMT2AATMPOLBMAPT | |
| SCHEMBL20862847 | 0.75 | ELANE (0.46) | ELANEKMT2AATMPOLBMAPT | |
| SCHEMBL9607783 | 0.74 | ELANE (0.49) | ELANEKMT2AATMPOLBMAPT | |
| SCHEMBL1098577 | 0.74 | ELANE (0.40) | ELANEKMT2AATM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220128904-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-04-28 | — | — | US | disclosed |