⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12855326 | 0.90 | — | — | |
| SCHEMBL12309108 | 0.89 | — | — | |
| SCHEMBL23351349 | 0.89 | — | — | |
| SCHEMBL12369736 | 0.86 | — | — | |
| SCHEMBL12352663 | 0.85 | — | — | |
| SCHEMBL26445968 | 0.84 | — | — | |
| SCHEMBL24852982 | 0.83 | — | — | |
| SCHEMBL12947960 | 0.83 | — | — | |
| SCHEMBL786965 | 0.83 | HMGCR (0.30) | — | |
| SCHEMBL24116219 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220146930-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2022-05-12 | — | — | US | disclosed |
| US-20220146931-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2022-05-12 | — | — | US | disclosed |