⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12604984 | 0.90 | — | — | |
| SCHEMBL19019484 | 0.90 | — | — | |
| SCHEMBL12997474 | 0.89 | ALDH1A1 (0.30) | — | |
| SCHEMBL25946787 | 0.88 | POLB (0.31) | — | |
| SCHEMBL22940980 | 0.88 | — | — | |
| SCHEMBL9244154 | 0.85 | HMGCR (0.38) | — | |
| SCHEMBL12929908 | 0.85 | HMGCR (0.30) | — | |
| SCHEMBL12357053 | 0.85 | HMGCR (0.30) | — | |
| SCHEMBL24409140 | 0.84 | — | — | |
| SCHEMBL18844966 | 0.83 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230139891-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND | FUJIFILM CORPORATION (JP) | 2023-05-04 | — | — | US | disclosed |