Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 2/20 | 0.43 |
| ▸ | MGAM | O43451 | 1/20 | 0.43 |
| ▸ | SI | P14410 | 1/20 | 0.43 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.43 |
| ▸ | MGLL | Q99685 | 1/20 | 0.36 |
| ▸ | ACHE | P22303 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.32 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | FAAH | O00519 | 1/20 | 0.31 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.31 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.31 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.30 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.30 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.30 |
| ▸ | PGR | P06401 | 1/20 | 0.30 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2439900 | 0.87 | MGLL (0.37) | GAAMGAMSIMGAM2MGLL | |
| SCHEMBL27365507 | 0.87 | MGAM (0.45) | GAAMGAMSIMGAM2HSD17B10 | |
| SCHEMBL1000675 | 0.78 | GAA (0.71) | GAAMGAMSIMGAM2MGLL | |
| SCHEMBL11367008 | 0.78 | MGLL (0.38) | GAAMGAMSIMGAM2MGLL | |
| SCHEMBL2127408 | 0.76 | MGLL (0.37) | GAAMGAMSIMGAM2MGLL | |
| SCHEMBL1464839 | 0.74 | MGLL (0.42) | GAAMGAMSIMGAM2MGLL | |
| SCHEMBL822230 | 0.71 | MGAM (0.48) | GAAMGAMSIMGAM2MGLL | |
| SCHEMBL23312209 | 0.70 | NPSR1 (0.47) | GAAACHETSHRHSD17B10KMT2A | |
| SCHEMBL3308061 | 0.70 | TSHR (0.36) | GAAMGAMSIMGAM2MGLL | |
| SCHEMBL9452748 | 0.70 | SOAT1 (0.37) | MGLLACHETSHRALDH1A1SOAT1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 68 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2450412-B1 | Silicone coating composition | MERCK PATENT GMBH (DE) | 2019-08-28 | — | — | EP | disclosed |
| EP-2102156-B1 | PHOTOACTIVE COMPOUNDS | MERCK PATENT GMBH (DE) | 2019-06-26 | — | — | EP | disclosed |
| EP-2121857-B1 | SILICONE COATING COMPOSITION | AZ ELECTRONIC MATERIALS USA (US) | 2014-06-04 | — | — | EP | disclosed |
| US-8252503-B2 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2012-08-28 | — | — | US | disclosed |
| EP-2122418-B1 | STRIPPER FOR COATING LAYER | AZ ELECTRONIC MATERIALS USA (US) | 2012-08-08 | — | — | EP | disclosed |
| US-8211621-B2 | Antireflective coating compositions | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2012-07-03 | — | — | US | disclosed |
| EP-2450412-A1 | Silicone coating composition | AZ Electronic Materials USA Corp. (US) | 2012-05-09 | — | — | EP | disclosed |
| EP-2370859-A2 | A PHOTOSENSITIVE COMPOSITION | AZ Electronic Materials USA Corp. (US) | 2011-10-05 | — | — | EP | disclosed |
| US-8026040-B2 | High silicon-content resin composition used to form thin film thermosets; form low k dielectric constant materials; hard mask and underlayer materials with anti-reflective properties for photolithography industry | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2011-09-27 | — | — | US | disclosed |
| US-8026201-B2 | Comprising: a fluoride source, an organic quaternary ammonium base, and a solvent selected from an organic solvent, water, and mixtures thereof; for removing silicon-based anti-reflective coatings/hardmask layers from microelectronics; etch selectivity | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2011-09-27 | — | — | US | disclosed |
| US-20080014529-A1 | ANTIREFLECTIVE COATING COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. | 2008-01-17 | — | — | US | disclosed |
| US-20080008954-A1 | HIGH SILICON-CONTENT THIN FILM THERMOSETS | AZ ELECTRONIC MATERIALS USA CORP. | 2008-01-10 | — | — | US | disclosed |
| WO-2007148221-A1 | HIGH SILICON-CONTENT THIN FILM THERMOSETS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-12-27 | — | — | WO | disclosed |
| US-20070248913-A1 | PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. | 2007-10-25 | — | — | US | disclosed |
| WO-2007057773-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-05-24 | — | — | WO | disclosed |
| US-20070111138-A1 | Photoactive compounds | MERCK PATENT GMBH (DE) | 2007-05-17 | — | — | US | disclosed |
| WO-2007007175-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIAL USA CORP. (DE) | 2007-01-18 | — | — | WO | disclosed |
| US-20070015084-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2007-01-18 | — | — | US | disclosed |
| US-20060131240-A1 | Process for treating solvents | AZ ELECTRONIC MATERIALS USA CORP. | 2006-06-22 | — | — | US | disclosed |
| WO-2006064368-A2 | PROCESS FOR TREATING SOLVENTS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2006-06-22 | — | — | WO | disclosed |