SCHEMBL24454813

SCHEMBL24454813

CCCCC#Cc1ccc2c3c(cccc13)C(=O)N(OS(=O)(=O)CCCC(F)(F)F)C2=O

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TDP1 Q9NUW8 2/20 0.34
▸ BRD4 O60885 3/20 0.34
▸ MEN1 O00255 4/20 0.34
▸ KMT2A Q03164 4/20 0.34
▸ POLB P06746 2/20 0.34
▸ MAPT P10636 2/20 0.34
▸ L3MBTL1 Q9Y468 2/20 0.34
▸ CNR2 P34972 3/20 0.33
▸ USP2 O75604 2/20 0.32
▸ ATM Q13315 2/20 0.32
▸ KCNH2 Q12809 1/20 0.32
▸ RGS12 O14924 1/20 0.32
▸ MAPK1 P28482 1/20 0.32
▸ HTT P42858 1/20 0.32
▸ NPSR1 Q6W5P4 1/20 0.32
▸ TLR9 Q9NR96 1/20 0.32
▸ CNR1 P21554 1/20 0.31
▸ GPR183 P32249 1/20 0.31
▸ KDM4E B2RXH2 2/20 0.30
▸ ALDH1A1 P00352 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18069191 0.92 BRD4 (0.40) TDP1BRD4MEN1KMT2APOLB
SCHEMBL18069178 0.86 MEN1 (0.39) TDP1BRD4MEN1KMT2APOLB
SCHEMBL18069175 0.83 TDP1 (0.40) TDP1BRD4MEN1KMT2APOLB
SCHEMBL18069146 0.82 KCNH2 (0.42) TDP1BRD4MEN1KMT2APOLB
SCHEMBL18069147 0.82 KCNH2 (0.42) TDP1BRD4MEN1KMT2APOLB
SCHEMBL18069148 0.82 KCNH2 (0.42) TDP1BRD4MEN1KMT2APOLB
SCHEMBL18069140 0.82 TDP1 (0.34) TDP1BRD4MEN1KMT2APOLB
SCHEMBL18069208 0.81 TDP1 (0.34) TDP1BRD4MEN1KMT2APOLB
SCHEMBL26375239 0.80 ELANE (0.38) TDP1BRD4MEN1KMT2APOLB
SCHEMBL18069183 0.80 TDP1 (0.39) TDP1BRD4MEN1KMT2APOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230314943-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST FILM USING THE SAME MERCK PATENT GMBH (DE) 2023-10-05 — — US disclosed
US-20220163888-A1 POSITIVE TYPE RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST PATTERN USING THE SAME MERCK PATENT GMBH (DE) 2022-05-26 — — US disclosed
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