⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL8841037 | 0.94 | — | — | |
| Ethylene SCHEMBL454696 | 0.89 | — | — | |
| Cyclohexane SCHEMBL8898885 | 0.85 | — | — | |
| Benzene SCHEMBL7529646 | 0.85 | — | — | |
| SCHEMBL367548 | 0.62 | — | — | |
| SCHEMBL1651208 | 0.62 | — | — | |
| SCHEMBL50647 | 0.59 | — | — | |
| SCHEMBL6741324 | 0.59 | — | — | |
| Bromide SCHEMBL11127118 | 0.59 | — | — | |
| SCHEMBL29522 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 683 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7713677-B2 | Photoresist composition, method of patterning thin film using the same, and method of manufacturing liquid crystal display panel using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-05-11 | — | — | US | claimed |
| EP-1238972-B1 | Novel carbazole derivative and chemically amplified radiation-sensitive resin composition | JSR CORP (JP) | 2009-12-16 | — | — | EP | claimed |
| US-7595143-B2 | Containing two binder resins produced by reacting m-cresol and p-cresol with salicylic aldehyde for first and with formaldehyde for second; heat resistance, pattern adhesion; photomasks, photoresists | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-09-29 | — | — | US | claimed |
| US-7314701-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-01-01 | — | — | US | claimed |
| US-20070190454-A1 | PHOTORESIST COMPOSITION, METHOD OF PATTERNING THIN FILM USING THE SAME, AND METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY PANEL USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-08-16 | — | — | US | claimed |
| EP-1311908-B1 | PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF | AZ ELECTRONIC MATERIALS USA (US) | 2007-06-20 | — | — | EP | claimed |
| US-7033728-B2 | Photoresist composition | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2006-04-25 | — | — | US | claimed |
| EP-1631863-A2 | PHOTORESIST COMPOSITION FOR DEEP UV AND IMAGING PROCESS THEREOF | AZ Electronic Materials USA Corp. (US) | 2006-03-08 | — | — | EP | claimed |
| EP-1035436-B1 | Resist pattern formation method | JSR CORP (JP) | 2005-09-07 | — | — | EP | claimed |
| WO-2005066714-A2 | PHOTORESIST COMPOSITION | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2005-07-21 | — | — | WO | claimed |
| US-6447980-B1 | POLY(MALEIC ANHYDRIDE-CO-T-BUTYL 5-NORBORNENE-2-CARBOXYLATE-CO-2-HYDROXYETHYL 5-NORBORNENE-2-CARBOXYLATE-CO-5-NORBORNENE-2-CARBOXYLIC ACID-CO-2-METHYL ADAMANTYL METHACRYLATE-CO-MEVALONIC LACTONE) AND ACID GENERATOR | CLARIANT FINANCE (BVI) LIMITED (VG) | 2002-09-10 | — | — | US | claimed |
| EP-0819981-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2002-06-05 | — | — | EP | claimed |
| WO-2002006901-A2 | PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF | CLARIANT INTERNATIONAL LTD (CH) | 2002-01-24 | — | — | WO | claimed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | claimed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | claimed |
| US-5952150-A | COMPRISING A DISULFONYLMETHANE DERIVATIVE, A RESIN PROTECTED BY AN ACID DECOMPOSABLE GROUP OR AN ALKALI-SOLUBLE RESIN AND AN ALKALI SOLUBILITY CONTROL AGENT; PHOTORESISTS | JSR CORPORATION (JP) | 1999-09-14 | — | — | US | claimed |
| EP-0819981-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-01-21 | — | — | EP | claimed |
| EP-0606756-B1 | Use of disulfonyl methanes for the control of parasites | LILLY CO ELI (US) | 1997-07-23 | — | — | EP | claimed |
| US-5614525-A | ANTHELMINTICS | ELI LILLY AND COMPANY (US) | 1997-03-25 | — | — | US | claimed |
| EP-0606756-A1 | Use of disulfonyl methanes for the control of parasites | ELI LILLY AND COMPANY (US) | 1994-07-20 | — | — | EP | claimed |