Benzene

Benzene

SCHEMBL7529646

O=S(=O)=C=S(=O)=O.c1ccccc1

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL8841037 0.80
Benzene SCHEMBL27282100 0.68 TP53 (0.43)
Benzene SCHEMBL28927988 0.60 TP53 (0.33)
Benzene SCHEMBL28112029 0.60 TP53 (0.33)
Benzene SCHEMBL5194700 0.60 TP53 (0.33)
Benzene SCHEMBL73337 0.60 TP53 (0.33)
Benzene SCHEMBL1821858 0.60 CA1 (0.67)
Benzene SCHEMBL8233367 0.60
Benzene SCHEMBL6360513 0.60 TP53 (0.33)
Benzene SCHEMBL11672180 0.57 TP53 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020039701-A1 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-04-04 US disclosed
EP-1136885-A1 Chemically amplified positive resist composition and patterning method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-09-26 EP disclosed