⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9699801 | 0.82 | — | — | |
| SCHEMBL26086446 | 0.72 | — | — | |
| SCHEMBL11844253 | 0.72 | ALDH1A1 (0.30) | — | |
| SCHEMBL20547668 | 0.72 | — | — | |
| Trifluoroethanol SCHEMBL8952016 | 0.70 | — | — | |
| Tribromoethanol SCHEMBL3496594 | 0.70 | ALDH1A1 (0.42) | — | |
| Tribromoethanol SCHEMBL26851 | 0.70 | — | — | |
| Trifluoroethanol SCHEMBL4869 | 0.70 | — | — | |
| Trifluoroethanol SCHEMBL28192499 | 0.70 | MEN1 (0.36) | — | |
| Trifluoroethanol SCHEMBL28317224 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 232 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118459372-A | Preparation method of photoacid generator sulfonate for ARF photoresist | 常州朗芯新材料科技有限公司 | 2024-08-09 | — | — | CN | claimed |
| CN-109796382-A | The salty photo-acid generator of long flexible chain, preparation method and photoetching compositions | 江苏南大光电材料股份有限公司 | 2019-05-24 | — | — | CN | claimed |
| CN-101687740-B | Processes for production of 2-bromo-2,2-difluoroethanol and 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid salt | CENTRAL GLASS CO LTD | 2014-07-02 | — | — | CN | claimed |
| CN-101687741-B | 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid salt and method for producing the same | CENTRAL GLASS CO LTD | 2014-02-19 | — | — | CN | claimed |
| US-8110711-B2 | Processes for production of 2-bromo-2,2-difluoroethanol and 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-02-07 | — | — | US | claimed |
| US-20110034721-A1 | 2-(Alkylcarbonyloxy)-1, 1-Difluoroethanesulfonic Acid Salt and Method for Producing the Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-02-10 | — | — | US | claimed |
| US-20110015431-A1 | Processes for Production of 2-Bromo-2,2-Difluoroethanol and 2-(Alkylcarbonyloxy)-1,1-Difluoroethanesulfonic Acid Salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-01-20 | — | — | US | claimed |
| US-20250271761-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | JSR CORPORATION (JP) | 2025-08-28 | — | — | US | disclosed |
| CN-119998271-A | Pyridone compound and preparation method and application thereof | 深圳信立泰药业股份有限公司 | 2025-05-13 | — | — | CN | disclosed |
| CN-119768739-A | Radiation-sensitive resin composition, pattern forming method, and radiation-sensitive acid generator | JSR株式会社 | 2025-04-04 | — | — | CN | disclosed |
| WO-2025070125-A1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2025-04-03 | — | — | WO | disclosed |
| WO-2025070119-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND ONIUM SALT COMPOUND | JSR株式会社 | 2025-04-03 | — | — | WO | disclosed |
| WO-2025067126-A1 | PYRIDONE COMPOUNDS AND PREPARATION METHOD THEREFOR, AND APPLICATION | 深圳信立泰药业股份有限公司 | 2025-04-03 | — | — | WO | disclosed |
| EP-0960176-A1 | TROPODEGRADABLE BROMINE-CONTAINING HALOCARBON ADDITIVES TO DECREASE FLAMMABILITY OF REFRIGERANTS, FOAM BLOWING AGENTS, SOLVENTS, AEROSOL PROPELLANTS, AND STERILANTS | UNIVERSITY OF NEW MEXICO (US) | 1999-12-01 | — | — | EP | disclosed |
| US-5900185-A | Tropodegradable bromine-containing halocarbon additives to decrease flammability of refrigerants, foam blowing agents, solvents, aerosol propellants, and sterilants | UNIVERSITY OF NEW MEXICO (US) | 1999-05-04 | — | — | US | disclosed |
| EP-0882715-A1 | NOVEL N-(UNSUBSTITUTED OR SUBSTITUTED)-4-SUBSTITUTED-6-(UNSUBSTITUTED OR SUBSTITUTED)PHENOXY-2-PYRIDINECARBOXAMIDES OR THIOCARBOXAMIDES, PROCESSES FOR PRODUCING THE SAME, AND HERBICIDES | KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1998-12-09 | — | — | EP | disclosed |
| WO-1998013437-A1 | TROPODEGRADABLE BROMINE-CONTAINING HALOCARBON ADDITIVES TO DECREASE FLAMMABILITY OF REFRIGERANTS, FOAM BLOWING AGENTS, SOLVENTS, AEROSOL PROPELLANTS, AND STERILANTS | THE UNIVERSITY OF NEW MEXICO (US) | 1998-04-02 | — | — | WO | disclosed |
| US-5039693-A | Pyrazole amides and insecticide and miticide containing them as active ingredient | MITSUBISHI KASEI CORPORATION (JP) | 1991-08-13 | — | — | US | disclosed |
| EP-0391131-A2 | Fluoroalkyl esters of thiophosphoric acid | BAYER AG (DE) | 1990-10-10 | — | — | EP | disclosed |
| EP-0365925-A1 | Pyrazole amides and insecticide and miticide containing them as active ingredient | Mitsubishi Chemical Corporation (JP) | 1990-05-02 | — | — | EP | disclosed |