SCHEMBL24533729

SCHEMBL24533729

CC(C)(O)c1ccc(OC(=O)c2ccc(C(=O)Oc3ccc(C(C)(C)O)cc3)cc2)cc1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.64
TDP1 Q9NUW8 1/20 0.64
L3MBTL1 Q9Y468 1/20 0.64
PRSS1 P07477 5/20 0.56
ACR P10323 5/20 0.56
KMT2A Q03164 5/20 0.50
MEN1 O00255 3/20 0.50
SMN1; SMN2 Q16637 2/20 0.50
ALDH1A1 P00352 2/20 0.50
HSD17B10 Q99714 1/20 0.50
THRB P10828 1/20 0.50
PARP10 Q53GL7 1/20 0.49
F2 P00734 1/20 0.47
PRSS2 P07478 1/20 0.47
PRSS3 P35030 1/20 0.47
LMNA P02545 1/20 0.47
CYP1A2 P05177 1/20 0.47
CYP2C9 P11712 1/20 0.47
CYP2C19 P33261 1/20 0.47
ELANE P08246 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL548392 1.00 MAPT (0.64) MAPTTDP1L3MBTL1PRSS1ACR
SCHEMBL548504 0.91 MAPT (0.78) MAPTTDP1L3MBTL1PRSS1ACR
SCHEMBL548358 0.91 MAPT (0.68) MAPTTDP1L3MBTL1PRSS1ACR
SCHEMBL24533754 0.91 MAPT (0.57) MAPTTDP1L3MBTL1PRSS1ACR
SCHEMBL548335 0.87 MAPT (0.50) MAPTTDP1L3MBTL1PRSS1ACR
SCHEMBL547575 0.87 MAPT (0.54) MAPTTDP1L3MBTL1PRSS1ACR
SCHEMBL2396251 0.86 MAPT (0.83) MAPTTDP1L3MBTL1PRSS1ACR
SCHEMBL14062435 0.86 MAPT (0.83) MAPTTDP1L3MBTL1PRSS1ACR
SCHEMBL547905 0.83 MAPT (0.58) MAPTTDP1L3MBTL1PRSS1ACR
SCHEMBL547590 0.83 PRSS1 (0.51) MAPTTDP1L3MBTL1PRSS1ACR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4258056-A2 ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-11 EP disclosed
US-20220197140-A1 ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-06-23 US disclosed