SCHEMBL24533754

SCHEMBL24533754

CC(C)(O)c1ccc(OC(=O)c2cc(C(=O)Oc3ccc(C(C)(C)O)cc3)cc(C(=O)Oc3ccc(C(C)(C)O)cc3)c2)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 3/20 0.57
▸ TDP1 Q9NUW8 1/20 0.57
▸ L3MBTL1 Q9Y468 1/20 0.57
▸ KMT2A Q03164 3/20 0.49
▸ SMN1; SMN2 Q16637 2/20 0.49
▸ MEN1 O00255 2/20 0.49
▸ ALDH1A1 P00352 2/20 0.49
▸ THRB P10828 1/20 0.49
▸ PRSS1 P07477 2/20 0.48
▸ ACR P10323 2/20 0.48
▸ HSD17B10 Q99714 1/20 0.44
▸ NSD2 O96028 1/20 0.43
▸ NPSR1 Q6W5P4 1/20 0.43
▸ LMNA P02545 1/20 0.42
▸ CYP1A2 P05177 1/20 0.42
▸ CYP2C9 P11712 1/20 0.42
▸ CYP2C19 P33261 1/20 0.42
▸ ELANE P08246 3/20 0.42
▸ PKM P14618 1/20 0.41
▸ NR1H4 Q96RI1 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547575 0.93 MAPT (0.54) MAPTTDP1L3MBTL1KMT2ASMN1; SMN2
SCHEMBL548392 0.91 MAPT (0.64) MAPTTDP1L3MBTL1KMT2ASMN1; SMN2
SCHEMBL24533729 0.91 MAPT (0.64) MAPTTDP1L3MBTL1KMT2ASMN1; SMN2
SCHEMBL24564661 0.89 MAPT (0.48) MAPTTDP1L3MBTL1KMT2ASMN1; SMN2
SCHEMBL548504 0.86 MAPT (0.78) MAPTTDP1L3MBTL1KMT2AMEN1
SCHEMBL547905 0.85 MAPT (0.58) MAPTTDP1L3MBTL1KMT2ASMN1; SMN2
SCHEMBL548335 0.82 MAPT (0.50) MAPTTDP1L3MBTL1KMT2ASMN1; SMN2
SCHEMBL548358 0.82 MAPT (0.68) MAPTTDP1L3MBTL1KMT2ASMN1; SMN2
SCHEMBL547614 0.81 MAPT (0.57) MAPTTDP1L3MBTL1KMT2ASMN1; SMN2
SCHEMBL548397 0.80 MAPT (0.44) MAPTTDP1L3MBTL1KMT2ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4258056-A2 ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-11 — — EP disclosed
US-20220197140-A1 ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-06-23 — — US disclosed
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