SCHEMBL24533735

SCHEMBL24533735

CCC(C)(CCOc1ccccc1)C(=O)OCc1ccccc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.47
L3MBTL1 Q9Y468 2/20 0.47
PPARA Q07869 2/20 0.46
PPARG P37231 2/20 0.46
PPARD Q03181 1/20 0.46
KDM4E B2RXH2 1/20 0.45
MEN1 O00255 1/20 0.45
KMT2A Q03164 1/20 0.45
MAOB P27338 2/20 0.44
ALDH1A1 P00352 1/20 0.44
PRKCA P17252 1/20 0.42
PRKCD Q05655 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
LMNA P02545 2/20 0.41
NPC1 O15118 1/20 0.41
ALOX15 P16050 1/20 0.41
TSHR P16473 1/20 0.41
MAPK1 P28482 1/20 0.41
HSD17B10 Q99714 1/20 0.41
ITGB3 P05106 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13705680 0.84 ALDH1A1 (0.50) MAPTL3MBTL1KDM4EMEN1KMT2A
SCHEMBL11015123 0.84 ALDH1A1 (0.56) MAPTL3MBTL1KDM4EMEN1KMT2A
SCHEMBL6258983 0.82 MAOB (0.51) MAPTL3MBTL1PPARAPPARGKDM4E
SCHEMBL23284063 0.82 ALDH1A1 (0.50) L3MBTL1MEN1KMT2AALDH1A1TDP1
SCHEMBL12565582 0.80 ALDH1A1 (0.51) MAPTL3MBTL1KDM4EMEN1KMT2A
SCHEMBL17617118 0.80 ALDH1A1 (0.51) L3MBTL1PPARAPPARGPPARDMEN1
SCHEMBL14946648 0.79 ALDH1A1 (0.50) MAPTL3MBTL1KDM4EMEN1KMT2A
SCHEMBL20253466 0.79 ALDH1A1 (0.50) MAPTL3MBTL1KDM4EMEN1KMT2A
SCHEMBL24765416 0.78 ALDH1A1 (0.44) MAPTL3MBTL1KDM4EMEN1KMT2A
SCHEMBL11640091 0.78 ALDH1A1 (0.53) L3MBTL1MEN1KMT2AALDH1A1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220197140-A1 ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-06-23 US disclosed