SCHEMBL2454337

SCHEMBL2454337

CC1=C(C)C(C)N(C)C(C)=C1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1642859 0.70 ADRA2C (0.33)
SCHEMBL9624456 0.70 MEN1 (0.36)
SCHEMBL5986747 0.63
SCHEMBL14924209 0.62 MEN1 (0.33)
SCHEMBL3110417 0.62 ADRA2C (0.42)
Hydrochloric Acid SCHEMBL5711451 0.60 ADRA2C (0.40)
SCHEMBL19458192 0.59
SCHEMBL487087 0.59 KDM4E (0.35)
SCHEMBL12604237 0.59
SCHEMBL11133011 0.58

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8822318-B2 Doping of semiconductor substrate through carbonless phosphorous-containing layer INERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-09-02 US disclosed
US-20130295754-A1 DOPING OF SEMICONDUCTOR SUBSTRATE THROUGH CARBONLESS PHOSPHOROUS-CONTAINING LAYER GLOBALFOUNDRIES U.S. INC. 2013-11-07 US disclosed
US-8481413-B2 Doping of semiconductor substrate through carbonless phosphorous-containing layer INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-07-09 US disclosed
US-20110223751-A1 DOPING OF SEMICONDUCTOR SUBSTRATE THROUGH CARBONLESS PHOSPHOROUS-CONTAINING LAYER INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-09-15 US disclosed
CN-101985413-A Onium salt compound KOEI CHEMICAL CO 2011-03-16 CN disclosed