SCHEMBL246033

SCHEMBL246033

C=C(C)C(=O)OCC1COC1

nearest known ligand 0.65

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.65
TSHR P16473 4/20 0.42
THRB P10828 1/20 0.40
CYP3A4 P08684 2/20 0.34
CYP2D6 P10635 1/20 0.34
CYP2C19 P33261 1/20 0.34
TP53 P04637 1/20 0.31
POLB P06746 1/20 0.30
APEX1 P27695 1/20 0.30
HTT P42858 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26861224 0.93 ALDH1A1 (0.61) ALDH1A1TSHRTHRBCYP3A4CYP2D6
SCHEMBL28289837 0.86 ALDH1A1 (0.53) ALDH1A1TSHRTHRBCYP3A4CYP2D6
SCHEMBL3238105 0.86 ALDH1A1 (0.57) ALDH1A1TSHRTHRBCYP3A4CYP2D6
SCHEMBL24963509 0.82 ALDH1A1 (0.57) ALDH1A1TSHRTHRBCYP3A4CYP2D6
SCHEMBL496421 0.82 ALDH1A1 (0.60) ALDH1A1TSHRTHRBCYP3A4CYP2D6
SCHEMBL2783842 0.82 ALDH1A1 (0.60) ALDH1A1TSHRTHRBCYP3A4CYP2D6
SCHEMBL12269715 0.82 ALDH1A1 (0.60) ALDH1A1TSHRTHRBCYP3A4CYP2D6
SCHEMBL246724 0.81 ALDH1A1 (0.51) ALDH1A1TSHRTHRBPOLBAPEX1
SCHEMBL28301347 0.81 ALDH1A1 (0.60) ALDH1A1TSHRTHRBCYP3A4CYP2D6
SCHEMBL15132111 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 455 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2338939-B1 CONDUCTIVE POLYMER SOLUTION, CONDUCTIVE COATING FILM AND INPUT DEVICE SHINETSU POLYMER CO (JP) 2019-01-16 EP claimed
CN-107450269-A High-toughness light-sensitive epoxy acrylic resin composition capable of being developed by weak alkaline water and preparation method thereof 浙江福斯特新材料研究院有限公司 2017-12-08 CN claimed
US-8728351-B2 Conductive polymer solution, conductive coating film and input device SHIN-ETSU POLYMER CO., LTD. (JP) 2014-05-20 US claimed
US-8563214-B2 Radiation sensitive resin composition and method of forming an interlayer insulating film SHARP CORPORATION (JP) 2013-10-22 US claimed
EP-4743828-A1 PHOTOCURABLE AS WELL AS THERMALLY CURABLE COMPOSITIONS SUITABLE FOR LOW TEMPERATURE CURING BASF SE (DE) 2026-05-20 EP disclosed
EP-4644983-A1 OPTICAL LAMINATE, METHOD FOR MANUFACTURING SAME, AND SMART WINDOW COMPRISING SAME Dongwoo Fine-Chem Co., Ltd. (KR) 2025-11-05 EP disclosed
CN-120051729-A Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element 日产化学株式会社 2025-05-27 CN disclosed
CN-119937243-A Chemically amplified positive photosensitive resin composition, cured film, and element having cured film 奇美实业股份有限公司 2025-05-06 CN disclosed
CN-119856108-A Liquid crystal aligning agent and liquid crystal display element 日产化学株式会社 2025-04-18 CN disclosed
CN-119768741-A Positive photosensitive resin composition 日产化学株式会社 2025-04-04 CN disclosed
WO-2025063731-A1 COLORED PHOTOSENSITIVE RESIN COMPOSITION, AND COLOR FILTER AND IMAGE DISPLAY DEVICE MANUFACTURED USING SAME 동우 화인켐 주식회사 2025-03-27 WO disclosed
CN-119604817-A Positive photosensitive resin composition 日产化学株式会社 2025-03-11 CN disclosed
CN-1871724-A Reactive polymer-supporting porous film for battery separator and use thereof NITTO DENKO CORP (JP) 2006-11-29 CN disclosed
US-20060141393-A1 Alkali-soluble resin; a quinone diazide; and a mixture of surfactants including a 3-(perfluoroalkyl)-1,2-epoxypropane, reaction product between methylhydrobis(trimethylsiloxy)silane and polyalkylene glycol monoallyl ether preferably having a molecular weight from 200 to 500 and a 2nd ether silicone SAMSUNG ELECTRONICS CO., LTD. 2006-06-29 US disclosed
US-20060131267-A1 Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel SAMSUNG DISPLAY CO., LTD. (KR) 2006-06-22 US disclosed
EP-1494072-A2 Radiation sensitive refractive index changing composition, pattern forming method and optical material JSR Corporation (JP) 2005-01-05 EP disclosed
US-20040265737-A1 Radiation sensitive refractive index changing composition, pattern forming method and optical material JSR CORPORATION (JP) 2004-12-30 US disclosed
US-6787289-B2 OPTICS JSR CORPORATION (JP) 2004-09-07 US disclosed
US-20030139486-A1 Radiation sensitive refractive index changing composition and refractive index changing method JSR CORPORATION (JP) 2003-07-24 US disclosed
EP-1323742-A2 Radiation sensitive refractive index changing composition and refractive index changing method JSR Corporation (JP) 2003-07-02 EP disclosed