⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24587095 | 0.72 | ALOX5AP (0.31) | — | |
| SCHEMBL29642292 | 0.68 | — | — | |
| SCHEMBL24489932 | 0.68 | — | — | |
| SCHEMBL13967230 | 0.66 | HSD11B1 (0.32) | — | |
| SCHEMBL17267412 | 0.65 | — | — | |
| SCHEMBL6050526 | 0.64 | — | — | |
| SCHEMBL18634200 | 0.62 | — | — | |
| SCHEMBL1634022 | 0.62 | HSD11B1 (0.36) | — | |
| SCHEMBL14492464 | 0.61 | — | — | |
| SCHEMBL1634321 | 0.60 | KMT2A (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230137472-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-04 | — | — | US | disclosed |
| US-20220221798-A1 | STORAGE CONTAINER STORING TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR | FUJIFILM CORPORATION (JP) | 2022-07-14 | — | — | US | disclosed |