⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hexane SCHEMBL3624927 | 0.87 | TSHR (0.39) | — | |
| SCHEMBL30423540 | 0.74 | — | — | |
| SCHEMBL22974968 | 0.67 | — | — | |
| SCHEMBL19998374 | 0.62 | — | — | |
| SCHEMBL5011936 | 0.62 | — | — | |
| SCHEMBL7388802 | 0.61 | — | — | |
| SCHEMBL6643241 | 0.61 | — | — | |
| SCHEMBL17987659 | 0.59 | — | — | |
| SCHEMBL18991388 | 0.57 | — | — | |
| SCHEMBL8720892 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230279031-A1 | N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METHODS OF PREPARATION THEREOF, AND SILICON NITRIDE FILMS FORMED THEREFROM | GELEST, INC. | 2023-09-07 | — | — | US | claimed |
| EP-1337588-B1 | SILICONE RUBBER FORMULATIONS AND THE USE THEREOF | MOMENTIVE PERFORMANCE MAT INC (DE) | 2009-01-14 | — | — | EP | claimed |
| WO-2025009354-A1 | EPOXY RESIN COMPOSITION, RESIN PASTE, FILM-TYPE ADHESIVE, PRINTED WIRING BOARD, SEMICONDUCTOR CHIP PACKAGE, AND ELECTRONIC DEVICE | 旭化成株式会社 | 2025-01-09 | — | — | WO | disclosed |
| US-20230279031-A1 | N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METHODS OF PREPARATION THEREOF, AND SILICON NITRIDE FILMS FORMED THEREFROM | GELEST, INC. | 2023-09-07 | — | — | US | disclosed |
| US-11702434-B2 | N-alkyl substituted cyclic and oligomeric perhydridosilazanes, methods of preparation thereof, and silicon nitride films formed therefrom | GELEST, INC. (US) | 2023-07-18 | — | — | US | disclosed |
| EP-4003710-A1 | A PROCESS AND A DEVICE ASSEMBLY USEFUL FOR PRODUCING A MOLDED SILICONE RUBBER PRODUCT FROM LIQUID SILICONE RUBBER COMPOSITION VIA INJECTION MOLDING | Elkem Silicones USA Corp. (US) | 2022-06-01 | — | — | EP | disclosed |
| CN-114075400-A | Use of silicon dioxide for improving the cathodic corrosion protection of a base coat | 赢创运营有限公司 | 2022-02-22 | — | — | CN | disclosed |
| EP-3332273-A1 | ITEM HAVING OPTIMIZED ADHESIVE PROPERTIES AND COMPRISING A SILICON ORGANIC LAYER | Essilor International (Compagnie Générale D'Optique) (FR) | 2018-06-13 | — | — | EP | disclosed |
| WO-2014022641-A1 | ACTUATION AND CONTROL OF STAMP DEFORMATION IN MICROCONTACT PRINTING | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2014-02-06 | — | — | WO | disclosed |
| US-8435882-B2 | Film forming method for a semiconductor | TOKYO ELECTRON LIMITED (JP) | 2013-05-07 | — | — | US | disclosed |
| US-8278205-B2 | Semiconductor device and method for manufacturing the same | TOKYO ELECTRON LIMITED (JP) | 2012-10-02 | — | — | US | disclosed |
| EP-0654149-A1 | POSITIVE-ACTING RADIATION-SENSITIVE MIXTURE AND RECORDING MATERIAL PRODUCED THEREWITH. | HOECHST AG (DE) | 1995-05-24 | — | — | EP | disclosed |
| EP-0600022-A1 | MATERIAL HAVING ANTIREFLECTION, HYDROPHOBIC AND ABRASION RESISTANCE PROPERTIES, AND METHOD OF DEPOSITING AN ANTIREFLECTION, HYDROPHOBIC, ABRASION RESISTANT COATING ON A SUBSTRATE. | COMMISSARIAT ENERGIE ATOMIQUE (FR) | 1994-06-08 | — | — | EP | disclosed |
| WO-1994003837-A1 | POSITIVE-ACTING RADIATION-SENSITIVE MIXTURE AND RECORDING MATERIAL PRODUCED THEREWITH | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-02-17 | — | — | WO | disclosed |
| WO-1991000303-A1 | CHIRAL POLYMERS AND THEIR USE FOR THE SYNTHESIS OF OPTICALLY ACTIVE COMPOUNDS WITH A HIGH DEGREE OF PURITY | RHONE-POULENC CHIMIE (FR) | 1991-01-10 | — | — | WO | disclosed |
| EP-0387623-A2 | Positive-working radiation-sensitive composition and radiation-sensitive recording material for use with high-energy radiation prepared therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1990-09-19 | — | — | EP | disclosed |
| EP-0324059-A2 | Positive working radiation-sensitive composition and radiation-sensitive recording material produced therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1989-07-19 | — | — | EP | disclosed |
| EP-0318649-A2 | Positive-working radiation-sensitive composistion and radiation-sensitive recording material produced therefrom for high-energy radiation | HOECHST AKTIENGESELLSCHAFT (DE) | 1989-06-07 | — | — | EP | disclosed |
| EP-0315748-A2 | Positive-working radiation-sensitive composistion and radiation-sensitive recording material produced therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1989-05-17 | — | — | EP | disclosed |
| EP-0312751-A2 | Positive-working radiation-sensitive composition and radiation-sensitive recording material produced therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1989-04-26 | — | — | EP | disclosed |