Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.39 |
| ▸ | THRB | P10828 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.36 |
| ▸ | LMNA | P02545 | 3/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.33 |
| ▸ | SLC22A1 | O15245 | 3/20 | 0.32 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | DNM1 | Q05193 | 5/20 | 0.30 |
| ▸ | MEN1 | O00255 | 2/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4630256 | 0.80 | — | — | |
| SCHEMBL4629786 | 0.78 | — | — | |
| SCHEMBL6840908 | 0.77 | — | — | |
| Hexane SCHEMBL5017645 | 0.64 | TSHR (0.88) | TSHRTHRBALDH1A1LMNASLC22A1 | |
| Hexane SCHEMBL357364 | 0.64 | TSHR (0.88) | TSHRTHRBALDH1A1LMNASLC22A1 | |
| Hexane SCHEMBL9859565 | 0.64 | TSHR (0.88) | TSHRTHRBALDH1A1LMNASLC22A1 | |
| Hexane SCHEMBL11650566 | 0.64 | TSHR (0.88) | TSHRTHRBALDH1A1LMNASLC22A1 | |
| Hexane SCHEMBL9557662 | 0.64 | TSHR (0.88) | TSHRTHRBALDH1A1LMNASLC22A1 | |
| Hexane SCHEMBL8705498 | 0.64 | TSHR (0.88) | TSHRTHRBALDH1A1LMNASLC22A1 | |
| Hexane SCHEMBL399 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2260352-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH | FUJIFILM Corporation (JP) | 2010-12-15 | — | — | EP | disclosed |
| WO-2009123341-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH | FUJIFILM CORPORATION (JP) | 2009-10-08 | — | — | WO | disclosed |