SCHEMBL24632344

SCHEMBL24632344

O=C(OC1CCCC(C(O)O)C1)c1cc(I)cc(I)c1I

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SERPINE1 P05121 1/20 0.39
▸ DPP4 P27487 3/20 0.36
▸ DPP7 Q9UHL4 3/20 0.36
▸ PREP P48147 2/20 0.36
▸ PTPN2 P17706 2/20 0.35
▸ PTPN1 P18031 2/20 0.35
▸ PTPRF P10586 1/20 0.35
▸ OPRK1 P41145 4/20 0.31
▸ HTR3A P46098 5/20 0.31
▸ MEN1 O00255 2/20 0.31
▸ KMT2A Q03164 2/20 0.31
▸ CYP1A2 P05177 2/20 0.31
▸ CYP2D6 P10635 2/20 0.31
▸ HTR3E A5X5Y0 2/20 0.31
▸ HTR3B O95264 2/20 0.31
▸ HTR3D Q70Z44 2/20 0.31
▸ HTR3C Q8WXA8 2/20 0.31
▸ CYP2C19 P33261 1/20 0.31
▸ NR1I2 O75469 1/20 0.31
▸ NPC1 O15118 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19678493 0.82 SERPINE1 (0.39) SERPINE1PTPN2PTPN1PTPRFHTR3A
SCHEMBL26426710 0.76 HTR3E (0.56) HTR3AMEN1KMT2ACYP1A2CYP2D6
SCHEMBL26833113 0.76 CHRNA7 (0.51) PTPN2PTPN1PTPRFHTR3AMEN1
SCHEMBL22097478 0.75 SERPINE1 (0.33) SERPINE1HTR3A
SCHEMBL26807706 0.75 HTR3E (0.38) PTPN2PTPN1PTPRFHTR3AMEN1
SCHEMBL26834880 0.74 PLAT (0.37) SERPINE1PTPN2PTPN1PTPRFHTR3A
SCHEMBL26807712 0.74 HTR3E (0.37) HTR3AMEN1KMT2ACYP1A2CYP2D6
SCHEMBL26343823 0.73 SERPINE1 (0.32) SERPINE1
SCHEMBL19678484 0.73 SERPINE1 (0.36) SERPINE1PTPN2PTPN1PTPRFMEN1
SCHEMBL26811240 0.73 HTR3E (0.34) PTPN2PTPN1PTPRFHTR3AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220299875-A1 RADIATION-SENSITIVE RESIN COMPOSITION, AND METHOD FOR FORMING PATTERN JSR CORPORATION (JP) 2022-09-22 — — US disclosed
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