SCHEMBL2465262

SCHEMBL2465262

CC(S)SCC1CSCCS1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1402667 0.84
SCHEMBL5072428 0.82
SCHEMBL5072467 0.74
SCHEMBL21753873 0.73
SCHEMBL5075151 0.70
SCHEMBL5071814 0.70
SCHEMBL21753886 0.69
SCHEMBL7626929 0.69
SCHEMBL21496010 0.67
SCHEMBL31337047 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-2023156222-A POLYTHIOL COMPOSITION, POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL AND PREPARATION METHOD FOR THE SAME 益豊新材料股▲ふん▼有限公司 2023-10-24 JP disclosed
CN-115594809-A Polythiol composition, polymerizable composition for optical material and preparation method of polymerizable composition 益丰新材料股份有限公司(CN) 2023-01-13 CN disclosed
US-8642718-B2 Curable composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-02-04 US disclosed
US-8013084-B2 Manufacturing method and apparatus of optical material SEIKO EPSON CORPORATION (JP) 2011-09-06 US disclosed
EP-2072560-A2 Manufacturing method and apparatus of optical material SEIKO EPSON CORPORATION (JP) 2009-06-24 EP disclosed
US-20090156781-A1 Manufacturing Method and Apparatus of Optical Material SEIKO EPSON CORPORATION (JP) 2009-06-18 US disclosed
US-20090018308-A1 Curable Composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2009-01-15 US disclosed
EP-1882713-A1 CURABLE COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-01-30 EP disclosed