⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5072472 | 0.78 | — | — | |
| SCHEMBL1402667 | 0.74 | — | — | |
| SCHEMBL2465262 | 0.74 | — | — | |
| SCHEMBL5072428 | 0.73 | — | — | |
| SCHEMBL5075151 | 0.68 | — | — | |
| SCHEMBL5071814 | 0.68 | — | — | |
| SCHEMBL5071967 | 0.60 | — | — | |
| SCHEMBL434791 | 0.59 | — | — | |
| SCHEMBL431538 | 0.59 | — | — | |
| SCHEMBL5072464 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023094257-A1 | A POLYMER BEING SUITABLE AS INERT COMPONENT OF A RADIATION CURING COATING AND IN PARTICULAR OF A RADIATION CURING INK | HUBERGROUP DEUTSCHLAND GMBH (DE) | 2023-06-01 | — | — | WO | claimed |
| WO-2023094257-A1 | A POLYMER BEING SUITABLE AS INERT COMPONENT OF A RADIATION CURING COATING AND IN PARTICULAR OF A RADIATION CURING INK | HUBERGROUP DEUTSCHLAND GMBH (DE) | 2023-06-01 | — | — | WO | disclosed |
| EP-1830205-B1 | CLOSE-BONDED DIFFRACTIVE OPTICAL ELEMENT | NIKON CORP (JP) | 2014-08-20 | — | — | EP | disclosed |
| US-8367872-B2 | a photocured acrylate polymer containing a monomer formed by reacting tricyclo[5.2.1.0(2,6)] decanedimethanol dicarylate and di(2-mercaptoethyl)sulfide or 2,5-di(mercaptomethyl)-1,4-dithian; a homogeneous high-refractive-index and low-dispersion resin layer | NIKON CORPORATION (JP) | 2013-02-05 | — | — | US | disclosed |
| US-20080107903-A1 | Close-Bonded Diffractive Optical Element, Optical Material Used Therefor, Resin Precursor, and Resin Precursor Composition | NIKON CORPORATION (JP) | 2008-05-08 | — | — | US | disclosed |
| EP-1830205-A1 | CLOSE-BONDED DIFFRACTIVE OPTICAL ELEMENT, OPTICAL MATERIAL USED THEREFOR, RESIN PRECURSOR, AND RESIN PRECURSOR COMPOSITION | Nikon Corporation (JP) | 2007-09-05 | — | — | EP | disclosed |